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Transparent conductive film, solar cell using same, sputtering target for forming said transparent conductive film, and manufacturing method therefor

A transparent conductive film, sputtering target technology, applied in sputtering coating, conductive layers on insulating carriers, circuits, etc., can solve the problems of solar cell power generation efficiency decline, conductivity deterioration, brightness decline and other problems

Active Publication Date: 2014-06-25
MITSUBISHI MATERIALS CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] However, conventional transparent conductive films made of Al-Mg-Zn-based oxides have the problem of insufficient moisture resistance due to the presence of a large amount of MgO which is an amphoteric oxide. When used, the conductivity of the film is significantly deteriorated in a short period of time due to the presence of moisture and oxygen, and the film loses its conductivity, resulting in a significant drop in the power generation efficiency of the solar cell
In addition, when used as a transparent conductive film for liquid crystals or organic ELs, degradation can cause a decrease in brightness or malfunction of liquid crystals or organic EL elements.

Method used

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  • Transparent conductive film, solar cell using same, sputtering target for forming said transparent conductive film, and manufacturing method therefor
  • Transparent conductive film, solar cell using same, sputtering target for forming said transparent conductive film, and manufacturing method therefor
  • Transparent conductive film, solar cell using same, sputtering target for forming said transparent conductive film, and manufacturing method therefor

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Embodiment

[0091] Hereinafter, the Example at the time of actually manufacturing the sputtering target for transparent conductive films is demonstrated based on said this embodiment.

[0092] The making of sputtering target of the present invention:

[0093] As a raw material powder, Al with a purity of 99.9% or more and an average particle size of 0.4 μm is weighed and blended 2 o 3 Raw material powder, MgO raw material powder with a purity of 99.9% or higher and an average particle size of 1 μm, Ga with a purity of 99.9% or higher and an average particle size of 0.3 μm 2 o 3 Raw material powder and ZnO raw material powder with a purity of 99.9% or more and an average particle size of 0.4 μm, so that it becomes the predetermined composition shown in Table 1, is put into a polyethylene pot, and ZrO with a diameter of φ3 (diameter φ3mm) is used 2 The balls are ball milled, and the average particle size of the mixed powder is pulverized to less than 0.4 μm (in addition, the solvent used...

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Abstract

[Problems] Provided is a transparent conductive film used for a liquid-crystal display device, an electroluminescent display device, or the like, and particularly suitable for use in a solar cell. Also provided is a solar cell using the transparent conductive film and a sputtering target suitable for forming the transparent conductive film. [Solving Means] The provided transparent conductive film is composed of an Al-Mg-Ga-Zn-based oxide of which the content ratios of metal component elements are 0.7-7% Al, 9.2-25% Mg, 0.015-0.085% Ga, and the remainder is Zn, by atomic ratio, and is excellent in moisture resistance.

Description

technical field [0001] The invention relates to a transparent conductive film used in liquid crystal display devices, organic electroluminescent display devices, antistatic conductive film coatings, gas sensors, solar cells, etc., solar cells using the transparent conductive film, and a method for forming the transparent conductive film Sputtering target for a transparent conductive film and method for producing the sputtering target, particularly to a transparent conductive film exhibiting excellent moisture resistance for a long period of time when used as a transparent conductive film for solar cells, and a sputtering method for forming the transparent conductive film target. Background technique [0002] At present, as one of the transparent conductive films used in liquid crystal display devices, electroluminescent display devices, antistatic conductive film coatings, gas sensors, solar cells, etc., Al-Mg-Zn-based oxides are known. transparent conductive film. In part...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/08C23C14/34H01B5/14H01L31/04
CPCH01L31/022466C23C14/08Y02E10/50H01L31/1884H01L31/022483C23C14/34H01B5/14H01L31/04
Inventor 张守斌陆田雄也山口刚近藤佑一
Owner MITSUBISHI MATERIALS CORP
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