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Tungsten-base tungsten trioxide nano film, and preparation method and application thereof

A technology of tungsten trioxide and nano-film materials, applied in the field of nano-materials, can solve the problems affecting the photoelectric catalytic performance, electrochemical performance and sensing performance of materials, peeling of films and conductive glass substrates, and easy charge recombination, etc. The effect of mechanical stability and service life, good electron transport performance and sensing performance, and easy regulation of growth

Inactive Publication Date: 2014-01-15
SHANGHAI JIAO TONG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in the existing hydrothermal chemical preparation method, since the substrate adopts conductive glass, conductive glass and WO 3 It is a combination of different elements and substances, which is an unnatural combination, and the binding force between them is poor, especially when subjected to external mechanical forces, or when the ambient temperature changes, due to the different expansion coefficients of materials, internal stress will occur. change, so that WO 3 Cracks or breaks occur between the conductive glass substrate and even cause WO 3 Delamination of film from conductive glass substrate
This unnatural combination of different elements in the film, the charge (including electrons, photogenerated electrons, holes) transport slowly, easy to recombine charges, will seriously affect the photocatalytic performance, electrochemical performance and sensing performance of the material, and affect its application

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  • Tungsten-base tungsten trioxide nano film, and preparation method and application thereof
  • Tungsten-base tungsten trioxide nano film, and preparation method and application thereof
  • Tungsten-base tungsten trioxide nano film, and preparation method and application thereof

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preparation example Construction

[0020] The preparation method of the tungsten-based tungsten trioxide nano-film material is as follows: after drying the polished and cleaned tungsten sheet, put it into a muffle furnace, control the temperature at 450-650° C. for 30 minutes, and form a layer on the surface of the metal tungsten. WO 3 The fine particles act as seeds for subsequent crystal growth; will be attached with WO 3 The tungsten sheet of the seed crystal is immersed in a hydrothermal reaction system, which contains polyethylene glycol with a volume fraction of 5-15% and a molecular weight of 200-400 as a crystal growth directing agent and tungsten with a concentration of 0.01-0.03mol / L Sodium acid solution is used as the material for crystal growth, and the inner wall of the reaction vessel is made of polytetrafluoroethylene material. The pH value of the reaction solution is adjusted to 1.0~2.0 with hydrochloric acid, the reaction temperature is controlled at 160~200°C, and the reaction time is 2-8h. D...

Embodiment 1

[0024] After the polished and cleaned tungsten sheet is dried, put it into a muffle furnace, control the temperature at 550°C for 30 minutes, and form a layer of WO on the surface of the metal tungsten. 3 The fine particles act as seeds for subsequent crystal growth; will be attached with WO 3The tungsten sheet of the seed crystal is immersed in a hydrothermal chemical reaction system. The hydrothermal reaction system contains polyethylene glycol with a volume fraction of 10% and a molecular weight of 300 as a crystal growth guiding agent and a sodium tungstate solution with a concentration of 0.02mol / L as a crystal growth agent. The inner wall of the reaction vessel is made of polytetrafluoroethylene material. Adjust the pH value of the reaction solution to 2.0 with hydrochloric acid, control the hydrothermal reaction temperature to 180°C, and the reaction time is 6 hours to complete the directional growth of tungsten trioxide on the surface of the tungsten substrate. ;Take o...

Embodiment 2

[0026] After the polished and cleaned tungsten sheet is dried, put it into a muffle furnace, control the temperature at 550°C for 30 minutes, and form a layer of WO on the surface of the metal tungsten. 3 The fine particles act as seeds for subsequent crystal growth; will be attached with WO 3 The tungsten sheet of the seed crystal is immersed in a hydrothermal chemical reaction system. The hydrothermal reaction system contains polyethylene glycol with a volume fraction of 10% and a molecular weight of 300 as a crystal growth guiding agent and a sodium tungstate solution with a concentration of 0.03mol / L as a crystal growth agent. The inner wall of the reaction vessel is made of polytetrafluoroethylene material. Adjust the pH value of the reaction solution to 2.0 with hydrochloric acid, control the hydrothermal reaction temperature to 180°C, and the reaction time is 2 hours to complete the directional growth of tungsten trioxide on the surface of the tungsten substrate. ;Take ...

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Abstract

The invention discloses a tungsten-base tungsten trioxide nano film material, and a preparation method and application thereof. The nano film material is a directional-growing highly-ordered tungsten trioxide nano film formed on a metal tungsten substrate. The preparation method comprises the following steps: carrying out oxidation treatment on a tungsten substrate to form fine WO3 seed crystals, carrying out hydrothermal reaction, and directionally growing WO3 crystals on the surface of the metal tungsten substrate under the actions of a polyethyleneglycol crystal growth guide agent and a crystal growth material sodium tungstate, thereby forming the highly-ordered tungsten-base tungsten trioxide nano film material which is firmly combined with the substrate. The invention has the advantages of large specific area, excellent photoelectric catalytic performance, excellent electronic transmission performance, excellent sensing performance, stable structure and long service life, and can be widely used in the fields of photocatalytic degradable organic matters, photoelectric catalytic degradable organic matters, hydrogen production by decomposing water, photoelectric catalytic COD (chemical oxygen demand) sensors, pH sensors, gas sensors and the like.

Description

technical field [0001] The invention relates to a nano material, in particular to a tungsten-based tungsten trioxide nano thin film material and its preparation method and application, belonging to the technical field of nano materials and applications. Background technique [0002] In recent years, tungsten trioxide (WO 3 ) The study of nano-thin film materials has attracted more and more attention. WO 3 It is an n-type semiconductor material with a narrow band gap (2.4-2.8eV), can respond to visible light, and has the same properties as TiO 2 Similar characteristics of photocatalysts, namely, stability, non-toxicity, photocorrosion resistance, low cost and high valence band potential (E VB +3.1~3.2V NHE ), strong oxidation ability of photogenerated holes (see J.Am.Chem.Soc., 2001, 123, 10639). Tungsten trioxide thin film has photocatalytic performance and sensing performance, can be used for photocatalytic degradation of organic matter, photocatalytic decomposition of...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C01G41/02B82Y40/00
Inventor 周保学陈全鹏李金花刘强李健勇
Owner SHANGHAI JIAO TONG UNIV
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