Method for preparing gradient transition layer between hard film and substrate

Abstract

The invention relates to a method for preparing a gradient transition layer between a hard film and a substrate. The method adopts a combination method of sputtering and radio frequency or microwave chemical vapor deposition to prepare the gradient transition layer, the adopted deposition equipment comprises one or two or more than two graphite targets and one or two or more than two metallic targets; radio frequency or direct current sputtering power supplies are adopted; the metallic targets are one type of pure metal of chromium, titanium, copper, aluminium, manganese, wolfram, molybdenum, iron, silicon, zinc, magnesium, tin, nickel, cobalt, indium, germanium and gallium or alloys which contain one or a plurality of elements of chromium, titanium, copper, aluminium, manganese, wolfram, molybdenum, iron, silicon, zinc, magnesium, tin, nickel, cobalt, indium, germanium and gallium; the sputtering gas is argon or helium; the substrate is connected with a radio frequency or microwave power supply through a sample stage, and radio frequency or microwave power is applied on the substrate during sputtering or reactive sputtering. The sputtering power supply of the metallic targets is regulated, so the current and voltage of the sputtering power supply are gradually reduced, or the sputtering or microwave power supply of the graphite targets is regulated, so the power of the sputtering or microwave power supply is gradually increased, and thus, the required gradient transition layer is obtained. The gradient transition layer which is prepared by the method can increase film and base binding force and film density, so the bearing capacity of the film is obviously improved.

Description

technical field [0001] The patent of the present invention relates to the preparation method of the gradient transition layer between the hard film and the substrate with strong film-base bonding force, high load bearing, and low friction and wear characteristics on the metal substrate. The hard film prepared by introducing this gradient transition layer can be widely used in various Surface protection and lubrication of metal materials. Background technique [0002] Hard films such as amorphous carbon-based films (diamond-like films) have low friction, low wear and excellent corrosion resistance in water or air, and are ideal self-lubricating materials for surface protection. However, due to the low bonding force between the general hard film and the metal material, the high internal stress of the film, and the lack of toughness, microcracks are prone to occur during the friction process. At the same time, there is a lack of systematic research on the film deposition method...

AI Technical Summary

Problems solved by technology

However, the deposition methods of the gradient transition layer currently used are mainly sputtering and reactive sputtering. The particles deposited into the film are mainly neutral atoms, the deposition rate is low, and the resulting thin film has poor compactness, especially the weak plasma, which is not conducive to the formation of compounds. Deposition of the transition layer

At the same time, since the sputtering target has a negative self-bias, it will cause ionized reactive components to deposit on the surface of the target, resulting in target poisoning and a decrease in the sputtering rate.

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