Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Conjugated polyelectrolyte photoelectric material and applications thereof in polymer light-emitting diodes

A conjugated polyelectrolyte, light-emitting diode technology, applied in the direction of organic chemistry, etc., can solve the problems of low conductivity, corrosion, PVK hole injection/transport performance is not very good, etc., to achieve favorable injection and transport, high conductivity rate effect

Active Publication Date: 2013-03-20
HAIMEN BIWEI INTPROP SERVICE CO LTD
View PDF3 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Among them, PEDOT:PSS is the most commonly used, but PEDOT:PSS is actually an acidic solution, which has a certain corrosion effect on the ITO anode, so using PEDOT:PSS as the hole injection layer will reduce the life and stability of the polymer light-emitting diode device. sex
Since PVK is a non-conjugated polymer with a main chain, its electrical conductivity is not high, so the hole injection / transport performance of PVK is not very good, which is also one of the unfavorable factors affecting the performance of polymer light-emitting diode devices.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Conjugated polyelectrolyte photoelectric material and applications thereof in polymer light-emitting diodes
  • Conjugated polyelectrolyte photoelectric material and applications thereof in polymer light-emitting diodes
  • Conjugated polyelectrolyte photoelectric material and applications thereof in polymer light-emitting diodes

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0023] Preparation of 4,4-dibromo-2-nitrobiphenyl (1)

[0024] Dissolve 4,4-dibromobiphenyl (20g, 64mmol) in glacial acetic acid (300mL), heat and stir at 110°C, add concentrated nitric acid (70%, 132mL) dropwise to glacial acetic acid, heat for 6h until solid Slowly dissolve, then cool to room temperature. The reaction solution was filtered, the solid was washed with water, and then recrystallized with ethanol to obtain a yellow solid (17.6g, yield77%). 1 H-NMR (300MHz, CDCl 3 ): (ppm) 8.32 (d, 2H), 8.29 (d, 2H), 7.77 (dd, 2H).

Embodiment 2

[0026] Preparation of 2,7-dibromocarbazole (2)

[0027] Triethyl phosphate (60 mL) added with compound 1 (16.5 g, 46.1 mmol) was heated to reflux for 18 h under nitrogen protection. The reaction liquid was distilled off under reduced pressure to remove excess solvent, and the residue was dissolved in a small amount of dichloromethane, then precipitated with petroleum ether to obtain the initial product, and then silica gel / petroleum ether column chromatography was used to obtain a white solid (9.28g, yield 62%). 1 H-NMR (300MHz, CDCl 3 ): δ (ppm) 8.20 (br, 1H, NH); 7.92 (d, 2H); 7.56 (d, 2H); 7.35 (dd, 2H).

Embodiment 3

[0029] Preparation of p-methylphenyl-1-bromo-6-hexyl ether (3)

[0030] Add p-cresol (28g), 1,6-dibromohexane (220mL), potassium carbonate (60g), tetrabutylammonium bromide (3.8g) and acetone (150mL) into a 500mL flask, heat and stir to reflux 48h. The reaction was cooled to room temperature, filtered, and the filtrate was spun with a circulating water pump until the mass was no longer reduced, and then distilled under reduced pressure with an oil pump, and the fraction collected at 210°C~220°C was a colorless oily product (53.5g, yield76.1%). 1 H-NMR (300MHz, CDCl 3 ): δ(ppm)7.10(d,2H); 6.82(d,2H); 3.96(t,2H); 3.45(t,2H); 2.32(s,3H); 1.8(br,8H).

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Maximum current efficiencyaaaaaaaaaa
Login to View More

Abstract

The invention discloses a conjugated polyelectrolyte photoelectric material and applications thereof in polymer light-emitting diodes. A side chain of the conjugated polyelectrolyte photoelectric material disclosed by the invention is provided with quaternary ammonium salt polar groups, so that the material can be dissolved in polar solvents such as methanol and ethanol, but is insoluble in solvents such as toluene and the like. The conjugated polyelectrolyte photoelectric material can be used as a hole-injection layer material to be applied to polymer light-emitting diodes.

Description

technical field [0001] The invention relates to the field of organic semiconductor photoelectric materials, in particular to a conjugated polyelectrolyte photoelectric material and its application in a hole injection layer of a polymer light emitting diode device. Background technique [0002] like figure 1 As shown, the polymer light-emitting diode device is mainly composed of a cathode 1 , a light-emitting layer 2 , a hole injection layer (HIL) 3 , an anode 4 , and a substrate 5 sequentially stacked. The light-emitting layer 2 is made of organic polymer material. When preparing a polymer light-emitting diode, usually indium tin oxide (ITO) is first set on the substrate 5 as the anode 4, and then the hole injection layer (HIL) 3 is set on the ITO anode 4, and then on the hole injection layer 3 A luminescent layer 2 is provided, and finally a metal cathode 1 is vapor-deposited on the luminescent layer 2, for example, a layer of CsF and a layer of metal Al are vacuum-evapor...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C08G61/12C07D209/86
Inventor 不公告发明人
Owner HAIMEN BIWEI INTPROP SERVICE CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com