A method for removing defect layers on the surface of silicon nanowire solar cells by oxidation and etching
A technology of solar cells and silicon nanowires, applied in chemical instruments and methods, circuits, electrical components, etc., can solve the problems of low surface minority carrier life, low battery efficiency, and low surface reflectivity, so as to reduce the surface recombination rate and improve Reduced carrier life and improved battery efficiency
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example 3
[0034] The silicon nanowires in Comparative Example 1 were selected.
[0035] 1. Oxidation
[0036] The silicon oxide layer is grown on the silicon nanowire by dry oxygen oxidation, and the heating temperature is 900 o C, the flow rate of oxygen is 50 sccm, the heating time is 30 min, and the thickness of the grown film is 10 nm.
[0037] 2. Corrosion
[0038] The above samples were etched with 1% HF etching solution for 30 min.
[0039] 3. Minority life span measurement
[0040] The measured minority carrier lifetime is 37.3μs.
example 4
[0042] The silicon nanowires in Comparative Example 1 were selected.
[0043] 1. Oxidation
[0044] The silicon nanowires were put into hydrogen peroxide with a volume concentration of 30%, and soaked at room temperature for 10 minutes.
[0045] 2. Corrosion
[0046] The above samples were etched with 3% HF etching solution for 10 min.
[0047] 3. Minority life span measurement
[0048] The measured minority carrier lifetime is 30.9μs.
example 5
[0050] The silicon nanowires in Comparative Example 1 were selected.
[0051] 1. Oxidation
[0052] The silicon oxide layer is grown on the silicon nanowire by dry oxygen oxidation, and the heating temperature is 850 o C, the flow rate of oxygen is 20 sccm, the heating time is 10 min, and the thickness of the grown film is 5 nm.
[0053]2. Corrosion
[0054] The above samples were etched with 1% HF etching solution for 30 min.
[0055] 3. Minority life span measurement
[0056] The measured minority carrier lifetime is 38.1μs.
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