Method of improving light current of silicon thin film solar cell

Abstract

The invention relates to a method of improving light current of a silicon thin film solar cell, and belongs to the photovoltaic technical field. The light trapping technique of a traditional silicon thin film solar cell mainly comprises that a front electrode and a rear electrode adopt a texture structure which often causes the enlarging of the surface recombination of current carriers and the density of the defect mode of an active layer, and meanwhile due to the fact that wet etching is needed, a process is complex and hard to control. In order to solve the mentioned problems, the invention provides a method of using surface plasmon of copper nanoparticles to increase light absorption, the core technique of the method is that magnet control sputtering equipment is used to deposite copper island film inside a vacuum chamber body, then in situ annealing is carried out to form a copper nanoparticle array, and the copper nanoparticle array is arranged close to two electrodes of the solar cell so as to stimulate the surface plasmon. By using the near field enhancement effect and the scattering effect of the surface plasmon, the light current is further improved. The method of improving the light current of the silicon thin film solar cell does not need wet etching, photoetching and other process, and therefore the cost of batteries can be greatly reduced.

Description

technical field [0001] The invention relates to a method for increasing the photoelectric current of a silicon thin-film solar cell, which belongs to the field of photovoltaic technology. Background technique [0002] In the field of photovoltaics, in order to increase the short-circuit current of silicon thin-film solar cells, people often use light trap technology to increase the distance of light in the cell. The current light trapping technology mainly uses the front electrode with a textured structure or the back reflector on the back of the battery. The biggest feature of this technology is that the transparent electrode has a certain texture, so it can play a role in light trapping. However, this technology also has great defects: (1) The texture of the transparent electrode is mostly formed by wet etching, which not only requires strong corrosive acid, but also the process conditions are not easy to control; (2) This texture Or the density of defect states in the ac...

AI Technical Summary

Problems solved by technology

[0003] In order to solve the shortcomings of the current silicon thin film solar cell light trapping technology, the present invention provides a new type of copper nanoparticle surface plasmon light trapping technology. The problem of complex process and difficult control is brought about; at the same time, it also solves the problem of carrier surface recombination and active layer defect state density increase due to texture; in addition, it can also be adjusted by adjusting the surface of copper particles The resonant frequency of the plasmon can be adjusted to trap light, so it can be flexibly matched with the band gap of the active layer of the battery, thereby effectively improving the photocurrent of the solar cell.

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