Cerium-based mixed rare earth polishing powder and preparation method thereof

Abstract

The invention discloses cerium-based mixed rare earth polishing powder and a preparation method thereof. The cerium-based mixed rare earth polishing powder is a uniform solid solution composed of a rare earth oxyfluoride and a cubic-phase rare earth oxide. Compared with the prior art, the preparation method has the advantages that partly fluorinated rare earth carbonate is mixed with rare earth carbonate so that fluoridation reaction uniformity is guaranteed and the problems of poor dehydration effects and a low yield of rare earth carbonate one-step fluorination are solved; through control of fluorine content, fluorination uniformity is guaranteed, the problem of free fluorions and fluorides which are produced because of non-uniformity of fluorination and influence a polishing precision and a polishing rate is solved, and a particle having an abnormally large part is not produced in calcination; product wear resistance is good, a polishing rate is fast, and a polishing precision can be controlled easily; product uniformity is good, production efficiency is high, a cost is low, and pollution is avoided; and the cerium-based mixed rare earth polishing powder is suitable for surface polishing processes on precision devices such as an integrated circuit, a flat-panel displayer and optical glass in an electronic information industry.

Description

technical field [0001] The invention relates to a rare earth polishing powder and a preparation method thereof, in particular to a cerium-based mixed rare earth polishing powder used for surface polishing of precision devices in the electronic information industry such as integrated circuits, flat displays, and optical glasses, and a preparation method thereof. Background technique [0002] At present, various glass materials are widely used, and these materials need to undergo necessary surface polishing before being applied. In the early days, materials such as zirconia, iron oxide or silicon dioxide were mainly used to polish various glass surfaces. In recent years, considering the polishing efficiency and precision, polishing materials with rare earth oxides (especially cerium oxide) as the main component have been used. It is considered more suitable for surface polishing of glass materials. [0003] With the rapid development of electronic information technology, the ...

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Problems solved by technology

[0007] The polishing powder produced by the above-mentioned existing production process will be due to the one-time fluorination, so the fluorination reaction will be uneven or partially fluorinated. On the one hand, it will affect the crystal phase structure of the product after roasting. On the other hand It will produce free fluorine ions that affect the polishing accuracy and rate, and the size and strength of the agglomerated particles formed after roasting are also very different. The polishing accuracy and polishing rate of the polishing powder are mainly determined by the size and Determined by the agglomeration strength, this will lead to a series of problems, such as scratches on the polished glass surface or a rapid decrease in the polishing rate in a very short period of time, especially when polishing a hard glass surface, the rapid decrease in the polishing rate is fatal; At the same time, the rare earth fluorocarbonate obtained in the fluorination process has a small particle size and is difficult to dehydrate, resulting in a low yield.

[0008] In order to meet the conditions, it is necessary to select a polishing powder product with a certain agglomeration strength and a certain particle size, and these characteristics are difficult to control, and the production process is complicated, the cost increases and the introduction of impurity ions causes quality fluctuations

[0009] In addition, for example, the invention patent with the patent publication number CN101010402A discloses a method of mixing rare earth oxide and rare earth fluoride, grinding, drying, roasting, and grading to prepare rare earth polishing powder. Although this method avoids the situation of uneven fluorination, However, the defect of this method is that the secondary sintering of the particles will occur, and some particles will grow abnormally after secondary roasting, forming local coarse particles, which will cause scratches during the polishing process.

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