Polydimethylsiloxane array micropore film preparation method

A technology of polydimethylsiloxane and dimethylsiloxane, which is applied in the field of microelectromechanical manufacturing systems (MEMS), can solve the problems of complex preparation steps, small film size, and restrictions on wide application, and achieve simple manufacturing methods , Guarantee the integrity and ensure the effect of uniformity

Active Publication Date: 2013-08-07
NANJING UNIV OF AERONAUTICS & ASTRONAUTICS
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Problems solved by technology

This method first needs to rely on the SU-8 plastic mold to make a PDMS micro-column structure template. Due to the difficulty of demolding between PDMS, the surface of the PDMS template needs to be treated with atmospheric pressure and radiofrequency plasma to prevent the mold from colloidal adhesion. Smooth demoulding,

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  • Polydimethylsiloxane array micropore film preparation method
  • Polydimethylsiloxane array micropore film preparation method
  • Polydimethylsiloxane array micropore film preparation method

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[0026] The manufacturing method of the array microporous film implemented by the device of the present invention will be specifically described below in conjunction with the accompanying drawings:

[0027] Step 1. Pretreatment of the substrate 11 under the mold. A layer of 5 micron thick SU-8-2005 photoresist was uniformly spin-coated on the surface of the substrate 11 under the mold using a homogenizing table, followed by pre-baking, full exposure, and post-baking to form a pre-treatment thin glue layer 10 to improve the SU-8 micro The binding force between the column and the base;

[0028] Step 2. Preparation of micro-column structure. The SU-8-2100 photoresist is spin-coated on the surface of the lower mold substrate 11 that has been pretreated in step 1, and the glue is homogenized on the homogenizing table, and then pre-baking, mask exposure, post-baking and development are performed to form SU- 8 micro-group column structure 9, such as image 3 Shown

[0029] Step 3. Fabrica...

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Abstract

The invention relates to a polydimethylsiloxane array micropore film preparation method, and belongs to the field of micro-electro-mechanic manufacturing. The method comprises: 1, coating a layer of an SU-8-2005 photoresist on the surface of a mold lower substrate (11) to form a pretreatment thin photoresist layer (10); 2, coating an SU-8 photoresist on the surface of the pretreated mold lower substrate (11) to form an SU-8 micro group column structure (9); 3, manufacturing a micro group column channel mold; 4, placing the micro group column channel mold into a film production container (4), and pouring a PDMS glue (6) into the container; 5, adopting a vacuum pumping manner to fill the PDMS glue into the micro group column channel so as to complete mold injection; 6, carrying out colloidal curing; and 7, separating the cured PDMS glue from a mold upper substrate (7) and the lower substrate (11). The prepared micropore film can be used for electrolytic machining so as to significantly improve locality and micro-scale processing capacity of mask electrolytic machining.

Description

technical field [0001] The invention relates to a method for preparing a polydimethylsiloxane (PDMS) array microporous film, belonging to the field of microelectromechanical manufacturing systems (MEMS). Background technique [0002] Polydimethylsiloxane (PDMS) is one of the silicone materials. It is a colorless and transparent elastic polymer. It is usually composed of PDMS prepolymer and curing agent according to a certain volume ratio (mass ratio) mixed and aggregated. It has strong organic and hydrophobic properties, good insulation, chemical stability, heat and cold resistance and corrosion resistance, non-flammable, non-toxic and pollution-free, suitable for processing various biochemical reaction chips, with High biocompatibility and gas permeability, can be used for cell culture, at the same time, low elastic modulus, easy to use, good for graphic reproduction, good self-closing, widely used in micro-contact imprinting in MEMS , microfluidic graphics, template-...

Claims

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Application Information

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IPC IPC(8): B29C67/20B81C1/00
Inventor 李寒松陈晓磊曲宁松朱荻
Owner NANJING UNIV OF AERONAUTICS & ASTRONAUTICS
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