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Polydimethylsiloxane array micropore film preparation method

A technology of polydimethylsiloxane and dimethylsiloxane, which is applied in the field of microelectromechanical manufacturing systems (MEMS), can solve the problems of complex preparation steps, small film size, and restrictions on wide application, and achieve simple manufacturing methods , Guarantee the integrity and ensure the effect of uniformity

Active Publication Date: 2013-08-07
NANJING UNIV OF AERONAUTICS & ASTRONAUTICS
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

This method first needs to rely on the SU-8 plastic mold to make a PDMS micro-column structure template. Due to the difficulty of demolding between PDMS, the surface of the PDMS template needs to be treated with atmospheric pressure and radiofrequency plasma to prevent the mold from colloidal adhesion. Smooth demoulding, and finally perform PDMS colloid injection molding to form a film according to the capillary phenomenon. The disadvantages are high cost, complicated preparation steps, surface treatment, small size of the film, poor repeatability, and limited imitation accuracy.
Its disadvantages limit the wide application of these methods

Method used

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  • Polydimethylsiloxane array micropore film preparation method
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Embodiment Construction

[0026] Below in conjunction with accompanying drawing, specify the manufacture method that device of the present invention implements array microporous film:

[0027] Step 1. Pretreatment of the base 11 under the mold. Spin-coat a layer of SU-8-2005 photoresist with a thickness of 5 microns on the surface of the lower substrate 11 of the mold by using a glue leveling table, and then perform pre-baking, full exposure, and post-baking to form a pre-treated thin glue layer 10 to improve the SU-8 micron thickness. The binding force between the column and the substrate;

[0028] Step 2, preparation of microcolumn structure. Spin-coat the SU-8-2100 photoresist on the surface of the lower substrate 11 of the mold that has been pretreated in step 1, level the glue on the leveling table, and then perform pre-baking, mask exposure, post-baking and development to form SU- 8 Micro-group pillar structures 9, such as image 3 shown;

[0029] Step 3, making the micro-column channel mold....

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Abstract

The invention relates to a polydimethylsiloxane array micropore film preparation method, and belongs to the field of micro-electro-mechanic manufacturing. The method comprises: 1, coating a layer of an SU-8-2005 photoresist on the surface of a mold lower substrate (11) to form a pretreatment thin photoresist layer (10); 2, coating an SU-8 photoresist on the surface of the pretreated mold lower substrate (11) to form an SU-8 micro group column structure (9); 3, manufacturing a micro group column channel mold; 4, placing the micro group column channel mold into a film production container (4), and pouring a PDMS glue (6) into the container; 5, adopting a vacuum pumping manner to fill the PDMS glue into the micro group column channel so as to complete mold injection; 6, carrying out colloidal curing; and 7, separating the cured PDMS glue from a mold upper substrate (7) and the lower substrate (11). The prepared micropore film can be used for electrolytic machining so as to significantly improve locality and micro-scale processing capacity of mask electrolytic machining.

Description

technical field [0001] The invention relates to a method for preparing a polydimethylsiloxane (PDMS) array microporous film, belonging to the field of microelectromechanical manufacturing systems (MEMS). Background technique [0002] Polydimethylsiloxane (PDMS) is one of the silicone materials. It is a colorless and transparent elastic polymer. It is usually composed of PDMS prepolymer and curing agent according to a certain volume ratio (mass ratio) mixed and aggregated. It has strong organic and hydrophobic properties, good insulation, chemical stability, heat and cold resistance and corrosion resistance, non-flammable, non-toxic and pollution-free, suitable for processing various biochemical reaction chips, with High biocompatibility and gas permeability, can be used for cell culture, at the same time, low elastic modulus, easy to use, good for graphic reproduction, good self-closing, widely used in micro-contact imprinting in MEMS , microfluidic graphics, template-...

Claims

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Application Information

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IPC IPC(8): B29C67/20B81C1/00
Inventor 李寒松陈晓磊曲宁松朱荻
Owner NANJING UNIV OF AERONAUTICS & ASTRONAUTICS
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