Standard comprehensive target board for rapid self-calibration of photoelectric system and measurement method for photoelectric system

A photoelectric system, a standard technology, applied in the direction of measuring devices, target indicating systems, optical instrument testing, etc., can solve the problems of measurement speed limitation, insufficient brightness, etc.

Active Publication Date: 2013-08-21
中国兵器工业第二0五研究所
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

This patent is suitable for photoelectric system calibration of high power density and high repetition frequency laser radiation, and the instantaneous infrared radiation brightness is insufficient for weaker power laser radiation
[0007] National Invention Patent Application No.: 2008102326185 "Calibration Method and Standard Target Plate for Dynamic Self-calibration of Carrier Photoelectric Series" discloses a standard target plate with circular holes and ring array patterns made of laser-induced transient luminescence and heat-generating materials. The circular hole and ring array patterns are suitable for visual judgment, but the measurement speed is limited

Method used

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  • Standard comprehensive target board for rapid self-calibration of photoelectric system and measurement method for photoelectric system
  • Standard comprehensive target board for rapid self-calibration of photoelectric system and measurement method for photoelectric system
  • Standard comprehensive target board for rapid self-calibration of photoelectric system and measurement method for photoelectric system

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Embodiment 1

[0043] according to figure 1 As shown, the preferred embodiment of the present invention provides a standard integrated target plate used on the focal plane of a collimator with a focal length of 3 m, including a substrate 1, a pattern 2, a base 3, and a pressure ring 4, which are sequentially tightly packed in a housing 5, it is characterized in that: the substrate 1 is an optical flat plate that transmits laser light, visible light, and infrared radiation. In this embodiment, a silicon carbide crystal flat plate is preferred, with a diameter of 8 mm and a thickness of 300 μm. The pattern 2 is attached to the substrate 1. Multi-layer metal film 21, nano display powder 22 composition; In this embodiment, it is preferred to plate tungsten thin film and then gold thin film on substrate 1, according to figure 2 , image 3 As shown, a through-hole array with a diameter of 10 μm and a hole spacing of 12 μm is etched on the metal film 21 by photolithography. The through holes are...

Embodiment 2

[0061] according to figure 1 As shown, the preferred embodiment 2 of the present invention provides a standard comprehensive target plate for placing at a distance of 100m, including a substrate 1, a pattern 2, a base 3, and a pressure ring 4, which are tightly packed in a housing 5 in turn, and its characteristics In that: the substrate 1 is an optical flat plate that transmits laser light, visible light, and infrared radiation. In this embodiment, the preferred sapphire flat glass has a diameter of 150 mm and a thickness of 3 mm. The pattern 2 consists of a metal film layer 21 attached to the substrate 1, Micro-nano display powder 22 composition; the preferred gold-plated film material in this embodiment, according to figure 2 , image 3 As shown, an electroplating process is adopted on the metal film 21 and an array of through holes with a diameter of 6 mm and a hole spacing of 7 mm is etched. The centers of adjacent through holes form an equilateral triangle. The throug...

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Abstract

The invention discloses a standard comprehensive target board for rapid self-calibration of a photoelectric system and a measurement method for the photoelectric system. The standard comprehensive target board is mainly technically characterized by comprising a base plate, a pattern, a substrate and a pressure ring. The base plate, the pattern, the substrate and the pressure ring are sequentially compressed and packaged in a housing. The pattern is formed by filling triangular through hole arrays which are etched a metal film and which are filled with micro-nano display powder. The standard comprehensive target board is placed in an optical system far field (a focal plane or far distance of a collimator) of the photoelectric system to be measured, the photoelectric system is aligned with the standard comprehensive target board to emit laser, the pattern of the standard comprehensive target board reflects a laser spot image and instantly radiate a visible-light and infrared laser spot image, the photoelectric system to be measured receives and stores the digital image, geometric center and linear length of a through hole and triangle complementary array in the digital image are calculated, and the geometric center and linear length are compared with theoretical values so that digital image correction function, resolution, radiation precision, tracking angular speed and tracking precision parameters of the photoelectric system are obtained.

Description

[0001] The detection field of the photoelectric system of the present invention mainly relates to a standard comprehensive target plate that instantaneously radiates high-resolution visible light images and infrared images caused by laser irradiation, especially relates to a metal film with etched hole arrays and filled with micro-nano display powder patterns The standard comprehensive target plate and the correction function, resolution, irradiation accuracy, tracking angular velocity, and fast measurement method of tracking accuracy of the photoelectric system. Background technique [0002] The photoelectric system usually consists of a photoelectric sensor, a stable platform, and a control and processing unit. The photoelectric sensor usually includes multiple optical systems and detectors in different radiation bands; the photoelectric system implements peripheral detection and tracking of targets in different radiation bands and outputs digital Image, rapid calibration of ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): F41J5/04G01M11/00
Inventor 南瑶李勤学候春屏贾选军桑鹏刘瑞星常伟军陈秀萍
Owner 中国兵器工业第二0五研究所
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