A kind of network low energy level p-type polymer semiconductor material and its preparation method and application
A compound and reaction technology, applied in the field of reticulated low-energy p-type polymer semiconductor materials and their preparation and application, can solve the problems of few reports on two-dimensional reticulated polymer materials, and achieve cheap raw materials and good repeatability. , the effect of extending the scope of application
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Embodiment 1
[0068] Example 1. Preparation of poly 1,2,5,6-tetrathienyl-3,4-diphenyldithienoacene (PTTDPT) represented by formula 8
[0069]
[0070] Formula 8
[0071] The reaction equation is as figure 1 shown.
[0072] (1) Synthesis of 1-methyl-2,5-dithienyl-3,4-benzophenonylpyrrole (Formula 1)
[0073] In a 150mL two-necked flask, vacuum argon. Then add 80mL of glacial acetic acid and 2.69g (10mmol) of N-methyl-N-benzoylphenylglycine in sequence, stir at room temperature for 30min, then add 2.64g (11mmol) of 1,2-dithienoylacetylene dropwise, heat up to reflux and stir 5h, terminate the reaction. Wash with water and saturated sodium bicarbonate solution in sequence, and filter to obtain 3.85 g (yield: 80%) of a tan product, which is the compound shown in Formula 1.
[0074] (2) Synthesis of N-methyl-2,5-dithienyl-3,4-diphenylthienopyrrole (Formula 2)
[0075] In a 250mL two-necked flask, vacuum argon. Then add 120mL of benzene and 4.51g (10mmol) of 1-methyl-2,5-diphenyl-3,4-di...
Embodiment 2
[0089] Example 2. Thin film field effect device and performance of poly 1,2,5,6-tetrathienyl-3,4-diphenyldithienoacene (PTTDPT)
[0090] (1) Preparation of semiconductor devices
[0091] Silicon wafer cleaning: Cut the silicon wafer with the silicon dioxide inorganic insulating layer into small pieces of suitable size, put it in a beaker, add a mixed solvent of hydrogen peroxide and concentrated sulfuric acid with a ratio of about 3:7, and heat it in an electric furnace for about 40 minutes , Pour off the solvent acid solution, rinse off the residual concentrated sulfuric acid and hydrogen peroxide with deionized water, then use deionized water and isopropanol to sonicate for about 10 minutes, and finally blow dry quickly with nitrogen.
[0092] Device preparation: PTPTDTP was deposited on a silicon wafer with 300nm silicon dioxide by spin coating, the solution used was 2mg / ml toluene solution, the speed was 3000 rpm, and the thickness of the organic semiconductor layer obtain...
Embodiment 3
[0096] Example 3. Preparation of the compound represented by formula 9 poly-1,2,3,45,6-hexaphenyldithienoacene (PHPDPT)
[0097]
[0098] Formula 9
[0099] (1) Synthesis of 1-methyl-2,5-diphenyl-3,4-di-p-bromobenzophenonylpyrrole (Formula 1’)
[0100] In a 150mL two-necked flask, vacuum argon. Then add glacial acetic acid 80mL N-methyl-N-benzoylphenylglycine 2.69g (10mmol) successively, stir at room temperature for 30min, then add 1,2-di-p-bromobenzoylacetylene 4.31g (11mmol) dropwise, heat up to reflux and stir 5h, terminate the reaction. Wash with water and saturated sodium bicarbonate solution successively, and filter to obtain 4.78 g (80% yield) of a tan product, which is the compound shown in formula 1'.
[0101] (2) Synthesis of N-methyl-2,5-diphenyl-3,4-di-p-bromophenylthienopyrrole (Formula 2')
[0102] In a 250mL two-necked flask, vacuum argon. Then add 120mL of benzene and 5.99g (10mmol) of compound 1' in sequence, raise the temperature to 60°C, stir and add...
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