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Process for plating precious metal film on porous ceramic based on magnetron sputtering through vacuum plating

A technology for porous ceramics and precious metals, applied in the field of ceramic vacuum coating process and porous ceramic vacuum coating precious metal film, can solve the problems of thin ceramic palladium film, poor meticulousness and homogeneity, uneven thickness of metal film, etc. Achieve the effect of improving the meticulousness, good homogeneity and uniform thickness of the metal film

Active Publication Date: 2013-09-25
SHANGHAI HYDROGEN MOBILE REFRMER INSTR
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  • Abstract
  • Description
  • Claims
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AI Technical Summary

Problems solved by technology

[0016] The palladium membrane separation process requires the use of ceramic palladium membrane. The existing ceramic palladium membrane preparation process usually uses electroless plating or electroplating. The prepared ceramic palladium membrane is thin, poor in precision and homogeneity, and the thickness of the metal film is uneven. , not yet adequate for the task of hydrogen separation
[0017] In view of this, there is an urgent need to design a new coating process to prepare ceramic metal films to overcome the defects of the existing ceramic metal films of insufficient precision and homogeneity

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  • Process for plating precious metal film on porous ceramic based on magnetron sputtering through vacuum plating

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Embodiment 1

[0048] see figure 1 , the present invention discloses a process for vacuum-plating precious metal films on porous ceramics based on magnetron sputtering, said process comprising the following steps:

[0049] [Step S1] The porous ceramic is placed in a vacuum chamber of a magnetron sputtering device.

[0050] [Step S2] Use the magnetic field generating mechanism of the magnetron sputtering device to generate a magnetic field, so that the metal target generates a bias current, and the metal target is used as a negative pole, so that the surface of the porous ceramic has a magnetic layer; the material of the metal target is expensive sputtering Metal; in the present embodiment, described precious metal is palladium-silver alloy, and mass percentage palladium accounts for 75%~78%, and silver accounts for 22%~25%; Such as, palladium-silver alloy comprises 75% palladium (mass percentage, the same below ), 25% silver, or 78% palladium, 22% silver. In addition, palladium silver allo...

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Abstract

The invention discloses a process for plating a precious metal film on a porous ceramic based on magnetron sputtering through vacuum plating. The process comprises the following steps: placing the porous ceramic in a vacuum chamber of a magnetron sputtering device; pumping out air in the vacuum chamber, and when the vacuum degree of the inside of the vacuum chamber is less than 5*10<-2> Pa, inflating an inert gas with a preset concentration into the vacuum chamber; galvanizing a metal target is galvanized and carrying out sputter coating; enabling ions generated by the metal target to collide with argon atoms in the process of flying to the surface of the porous ceramic in an accelerated mode under the action of electric fields so as to ionize large amounts of argon ions and electrons, and enabling the electrons fly to the surface of the porous ceramic; enabling the argon ions to bombard the metal target in an accelerated mode under the action of electric fields so as to sputter a large number of target atoms or molecules of the metal target, and depositing neutral target atoms or molecules on the surface of the porous ceramic so as to form a precious metal thin film with the thickness of 1-15 mu m; introducing the atmosphere or other preset gas into the vacuum chamber, and taking out a workpiece. According to the invention, the tightness and homogeneity of prepared porous ceramic coated films can be improved.

Description

technical field [0001] The invention belongs to the technical field of coating technology, and relates to a vacuum coating technology for ceramics, in particular to a technology for vacuum coating precious metal films on porous ceramics based on magnetron sputtering. Background technique [0002] Among the many new energy sources, hydrogen energy will become the most ideal energy source in the 21st century. This is because, in the case of burning the same weight of coal, gasoline and hydrogen, hydrogen produces the most energy, and the product of its combustion is water, without ash and waste gas, and will not pollute the environment; while the combustion of coal and oil produces These are carbon dioxide and sulfur dioxide, which produce the greenhouse effect and acid rain, respectively. The reserves of coal and oil are limited, while hydrogen is mainly stored in water, and the only product after combustion is water, which can continuously produce hydrogen and never run out...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C04B41/88
Inventor 向华孙菁婧向得夫
Owner SHANGHAI HYDROGEN MOBILE REFRMER INSTR
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