A kind of preparation method of crystalline silicon nano solar cell
A technology of solar cells and crystalline silicon cells, which is applied in nanotechnology, circuits, electrical components, etc., can solve the problems of expensive production costs, production and application limitations of solar cells, and achieve improved cell efficiency, increased efficiency, and increased back reflection Effect
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Embodiment 1
[0019] Example 1: Apply the preparation method of the crystalline silicon nano solar cell of the present invention to prepare the crystalline silicon nano solar cell:
[0020] (1) The back of the crystalline silicon cell is polished with a mixed acid system to remove mechanical damage and defects of the silicon wafer;
[0021] (2) On the polished emitter layer and the back surface of the crystalline silicon cell, Al is prepared by plasma-enhanced chemical vapor deposition or atomic layer deposition (ALD) 2 o 3 Dielectric film;
[0022] (3) Prepare nanowire arrays on the dielectric film on the back of crystalline silicon cells by chemical etching or laser;
[0023] (4) The nanowire array is diffused on the back of the crystalline silicon cell;
[0024] (5) Passivate the surface properties of nanowire arrays by thermal oxidation process;
[0025] (6) Use laser ablation process to make local contact on the back;
[0026] (7) Preparation of metal electrodes for crystalline s...
Embodiment 2
[0028] Example 2: Apply the preparation method of the crystalline silicon nano solar cell of the present invention to prepare the crystalline silicon nano solar cell:
[0029] (1) The back of the crystalline silicon cell is polished with a mixed acid system to remove mechanical damage and defects of the silicon wafer;
[0030] (2) On the emitter layer and the back surface of the polished crystalline silicon cell, use PECVD to generate silicon oxide and silicon nitride dielectric films;
[0031] (3) Prepare nanowire arrays on the dielectric film on the back of crystalline silicon cells by chemical etching or laser;
[0032] (4) The nanowire array is diffused on the back of the crystalline silicon cell;
[0033] (5) Using electroless plating or electroplating technology, deposit 50nm platinum nanoparticles on the surface of the silicon nanowire array to passivate the surface properties of the nanowire array;
[0034] (6) Use laser ablation process to make local contact on th...
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