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Flaky vanadium dioxide film material and preparation method thereof

A technology of vanadium dioxide flake and thin film materials, applied in electrolytic coatings, surface reaction electrolytic coatings, coatings, etc., can solve the problems of unstable product performance, harsh reaction conditions, and difficulty in large-scale industrial production, and achieve The effect of good controllability of film morphology and excellent performance

Inactive Publication Date: 2014-02-05
SHANGHAI NORMAL UNIVERSITY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] In order to solve the problems encountered in the preparation of vanadium dioxide thin films, such as the magnetron sputtering method first forms a film and then forms a phase during the film formation process, resulting in more impurity phases; the hydrothermal method requires secondary film formation, and the reaction conditions are harsh. The cycle is long, and it is difficult to apply to large-scale industrial production; the product obtained by the sol-gel method is prone to deformation due to shrinkage during annealing treatment, and the product performance is not stable enough. thin film method

Method used

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  • Flaky vanadium dioxide film material and preparation method thereof
  • Flaky vanadium dioxide film material and preparation method thereof
  • Flaky vanadium dioxide film material and preparation method thereof

Examples

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Embodiment 1

[0026] (1) Take an appropriate amount of vanadyl sulfate and dissolve it in a mixture of deionized water and ethanol at a volume ratio of 1:1, with a concentration of 0.2mol / L;

[0027] (2) Add sodium chloride and dispersant, stir for 20 minutes, and ultrasonically disperse for 30 minutes to obtain a blue clear solution;

[0028] (3) Adjust the pH value of the solution to 2.6-2.7, and let it stand for 3 days;

[0029] (4) Wash and dry the FTO substrate in sequence with ethanol, acetone, hydrochloric acid, and deionized water;

[0030] (5) Put the substrate and electrodes into the electrolyte in parallel with a distance of 2.5cm, apply a DC voltage of 1.5V, and power on for 20 minutes to perform anodic oxidation deposition coating;

[0031] (6) After the deposition, the sample was dried at 100°C for 40 minutes, and then annealed at 510°C for 12 hours in a nitrogen atmosphere to obtain a thin film.

[0032] figure 1 It is the XRD spectrum of the vanadium dioxide flake thin fi...

Embodiment 2- Embodiment 4

[0037] According to the experimental parameters in Table 1, referring to the method of Example 1, vanadium dioxide flake films can be obtained.

[0038] Table 1

[0039]

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Abstract

The invention discloses a flaky vanadium dioxide film material and a preparation method thereof. The preparation method comprises the following steps: performing deposition film coating within a certain voltage range by using an anodic oxidation method and performing annealing treatment within a certain temperature range, thus obtaining a film with a flaky structure. In a solution for deposition film coating, the mixed liquor of water and one or more than one of alcohols such as methanol, ethanol and n-propanol is used as a solvent, wherein the volume ratio of the alcohols to the water is 0:1 to 1:1; and a quadrivalent vanadium compound is used as a solute and the molar concentration is 0.01 to 10mol / L. The pH value of the solution is regulated to a certain interval and an auxiliary and a dispersing agent are added for aging for a certain time. The flaky vanadium dioxide film prepared by the anodic oxidation method has a uniform and regular shape and a large specific surface area; reaction conditions are mild, a process is simple, and the preparation method is high in efficiency, low in energy consumption and suitable for popularization and application.

Description

technical field [0001] The invention belongs to the field of functional materials, and relates to a vanadium dioxide flake film and a preparation method thereof, in particular to applying an anodic oxidation method for depositing and coating, followed by annealing in a certain temperature range, and finally obtaining flakes on the substrate surface at one time. method for thin-film structures. Background technique [0002] Vanadium, a transition metal element, has excellent physical and chemical properties and is known as the metal "vitamin". It is widely used in aerospace, metallurgy, materials, chemical industry, energy, optoelectronics and many other fields. Many vanadium oxides have strange phase transition properties, and vanadium dioxide (VO 2 ) has attracted much attention because the transition temperature is closest to room temperature. The world's most advanced research institutions such as the Oak Ridge National Laboratory in the United States have invested in it...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C25D11/26
Inventor 许东芳屈钰琦刘志甫李永祥何其庄
Owner SHANGHAI NORMAL UNIVERSITY
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