Preparation method of super-hydrophobic porous mesh for oil water separation
An oil-water separation and superphobic technology, applied in separation methods, liquid separation, chemical instruments and methods, etc., can solve the problems of complex operation, high cost, membrane fouling, etc., and achieve simple operation, low cost, and controllable experimental parameters. Effect
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[0019] Specific embodiment 1: This embodiment prepares a superhydrophobic mesh porous film according to the following steps:
[0020] Such as figure 2 As shown, the hydrogen bubble template electrodeposition method of porous mesh Sn film is a platinum sheet (1cm 2 ) Is used as the anode, and the counter electrode uses copper mesh (aperture 300μm, area 3*3cm 2 ) Is the cathode, and its electroplating device such as figure 1 Shown. The pretreatment of the copper mesh in the experiment included polishing, degreasing, acid etching, water washing, absolute ethanol soaking, acetone cleaning, and low-temperature blast drying. The composition of the plating solution is 0.01-0.2mol·L -1 SnSO 4 And 0.01-0.2mol·L -1 H 2 SO 4 , PH is controlled in the range of 4.0±0.5, and the current density range of electrodeposition is 0.1-6.0A·cm -2 , The deposition time is 5-40s. By adjusting the deposition parameters such as current density, deposition time, and composition of the plating solution, th...
Example Embodiment
[0023] Specific implementation manner 2: In this implementation manner, the superhydrophobic mesh porous film is prepared according to the following steps:
[0024] Hydrogen bubble template electrodeposition of mesh porous Sn film is a platinum sheet (1cm 2 ) Is used as the anode, and the counter electrode uses copper mesh (aperture 300μm, area 3*3cm 2 ) Is the cathode. The pretreatment of the copper mesh in the experiment included polishing, degreasing, acid etching, water washing, absolute ethanol soaking, acetone cleaning, and low-temperature blast drying. The composition of the plating solution is 0.05mol·L -1 SnSO 4 And 1.5mol·L -1 H 2 SO 4 , PH is controlled within the range of 4.0±0.5, and the current density of electrodeposition is 2.0A·cm -2 , The deposition time is 10s. The deposited mesh film should be rinsed immediately with distilled water, soaked in absolute ethanol and dried to obtain a mesh porous Sn film.
[0025] Such as image 3 As shown, the area of the super...
Example Embodiment
[0026] Specific embodiment 3: In this embodiment, the superhydrophobic mesh porous film is prepared according to the following steps:
[0027] Hydrogen bubble template electrodeposition of mesh porous Sn film is a platinum sheet (1cm 2 ) Is used as the anode, and the counter electrode uses copper mesh (aperture 300μm, area 3*3cm 2 ) Is the cathode. The pretreatment of the copper mesh in the experiment included polishing, degreasing, acid etching, water washing, absolute ethanol soaking, acetone cleaning, and low-temperature blast drying. The composition of the plating solution is 0.1mol·L -1 SnSO 4 And 1.5mol·L -1 H 2 SO 4 , PH is controlled within the range of 4.0±0.5, and the current density of electrodeposition is 2.0A·cm -2 , The deposition time is 10s. The deposited mesh film should be rinsed immediately with distilled water, soaked in absolute ethanol and dried to obtain a mesh porous Sn film.
[0028] Soak the above mesh porous Ni film in an ethanol solution containing 5mmo...
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