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Etching composition containing copper metal layer used for display device and method of etching composition

A composition, copper metal technology, applied in the direction of instruments, optics, nonlinear optics, etc., can solve the problems of slow etching speed, lack of etching uniformity, etc., achieve uniform etching, excellent etching uniformity, and provide the effect of cost competitive advantage

Inactive Publication Date: 2014-07-02
SOLVAY SA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the use of such etching solutions has disadvantages such as lack of etch uniformity and / or slowing of etch rate

Method used

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  • Etching composition containing copper metal layer used for display device and method of etching composition
  • Etching composition containing copper metal layer used for display device and method of etching composition
  • Etching composition containing copper metal layer used for display device and method of etching composition

Examples

Experimental program
Comparison scheme
Effect test

example 1

[0053] Example 1: Preparation of Etching Solution (1)

[0054]Prepare 2 L of an etching solution (comprising the following components) for the conductive metal layer in the LCD device. Etching was performed on the samples (20 mm × 20 mm) prepared by the above method with a spray etching device at a temperature of 30 °C under a pressure of 0.1 MPa for 35 s. ISJJX-Y-PP 020Y, IKEUCHI (2 L / min at 0.2 MPa) was used as one nozzle, and the spraying distance was 100 mm. The post-etch shape and surface state of the conductive metal layer in the LCD device were determined by using scanning electron microscopy (SEM).

[0055]

[0056]

[0057] The etching composition is used to etch a conductive metal layer in an LCD device. The exposed metal layer is selectively and clearly etched without damage to the photoresist layer. SEM was used to confirm a good taper angle (40° to 50°) of the etched copper. The etching rate of the copper layer constituting the conductive metal layer is 0...

example 2

[0059] Example 2: Preparation of Etching Solution (2)

[0060] Prepare 2 L of an etching solution (comprising the following components) for the conductive metal layer in the LCD device. Etching was performed on the samples (20 mm × 20 mm) prepared by the above method with a spray etching device at a temperature of 30 °C under a pressure of 0.1 MPa for 30 s. ISJJX-Y-PP 020Y, IKEUCHI (2 L / min at 0.2 MPa) was used as one nozzle, and the spraying distance was 100 mm. The post-etch shape and surface state of the conductive metal layer in the LCD device were determined by using scanning electron microscopy (SEM).

[0061]

[0062]

[0063] The etching composition is used to etch the conductive metal layer in the LCD device. The exposed metal layer is selectively and clearly etched without damage to the photoresist layer. A good taper angle (40° to 50°) of the etched copper was confirmed. The etching rate of the copper layer constituting the conductive metal layer is 0.30-0....

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Abstract

The invention relates to an etching composition containing the copper metal layer used for display device. The composition comprises at least one copper ion source, at least one fluorine ion source, at least one inorganic acid and / or salt, a first organic composition containing nitrogen, one organic composition containing nitrogen. The first organic composition containing nitrogen selects the free aliphatic amine, the aromatic amine, and other compositions, and the second organic composition containing nitrogen selects the free aliphatic amine,the multi-chargeable amine compounds, and other compositions. According to the invention, the etching composition can be used to provide the excellent ectching uniformity without causing any damages on the semiconductor layer on the lower part.

Description

technical field [0001] The present invention relates to an etching composition for use in a copper-containing metal layer in a display device, such as a liquid crystal display (LCD) device, and a method of etching the metal layer with the etching composition. Background technique [0002] Liquid crystal display (LCD) is gradually attracting attention as a main display device (in addition to plasma display panel (PDP) or field emission display (FED)) for mobile devices, computer monitors, and televisions. Among these LCD devices, thin film transistor (TFT) type LCD devices have several conductive electrodes and signal electrodes, such as gate, source, drain, and thus signal lines, which function to transmit signals to elements. [0003] Specifically, the resistance of the metals that make up such electrodes and / or signal lines is a major factor causing signal delays, and because of this, copper (Cu), which has superior electrical properties, would be preferred over other know...

Claims

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Application Information

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IPC IPC(8): C23F1/18
CPCC23F1/18G02F1/13439G02F1/136286
Inventor W.H.胡S.K.李Y-H.帕克
Owner SOLVAY SA
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