A kind of solar energy selective absorption coating with high temperature resistance and salt spray resistance in the atmosphere and preparation method thereof
An absorbing coating and high temperature resistant technology, applied in solar thermal power generation, coatings, solar thermal devices, etc., can solve problems such as low deposition rate, unstable microstructure and physical properties, complex process, etc.
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[0073] The invention provides a method for preparing a high-temperature-resistant, salt-spray-resistant solar energy selective absorption coating in the atmosphere, such as figure 2 shown, including the following steps:
[0074] Step 1: preparing a first diffusion barrier layer on the substrate;
[0075] The pure metal target intermediate frequency magnetron sputtering method is adopted. The pure metal target is Al target, Ti target, Si target or Cr target, and Ar gas is used as the sputtering gas. The substrate is made of stainless steel, and the vacuum chamber is pre-pumped before sputtering. Vacuum to 4×10 -3 ~5×10 - 3 Pa, through the inert gas Ar and O 2 as sputtering atmosphere, or Ar and N 2 As the sputtering atmosphere, the Ar gas flow rate is 100-140 sccm, the oxygen flow rate is 20-45 sccm, if nitrogen gas is used, the flow rate is 8-20 sccm, the sputtering distance is adjusted to 130-150 mm, and the sputtering pressure is adjusted to 3×10 -1 ~4×10 -1 Pa, turn...
Embodiment 1
[0109] This embodiment provides a SiO 2 and TiO 2 Atmospheric high temperature resistant, salt spray resistant solar selective absorption coating of the structure, the coating includes six coatings, divided into the first layer of diffusion barrier layer, the second layer of infrared emission layer, the third layer of diffusion barrier layer, the fourth layer of Layer absorption layer, fifth layer of anti-reflection layer, sixth layer of organic protective layer.
[0110] The first layer of TiO 2 The thickness of the film is 50nm, the total thickness of the second Cu film is 150nm, and the third layer of TiO 2 The film is 50nm, the fourth layer of SiO 2 +TiO 2 The film is 140nm, where the first sublayer SiO 2 +TiO 2 The film thickness is 80nm, the second sublayer SiO 2 +TiO 2 The film thickness is 60nm, the SiO in the first sublayer 2 The volume percentage is 40%, the rest is TiO 2 ; second sublayer SiO 2 The volume percentage is 60%, the rest is TiO 2 ; the fifth ...
Embodiment 2
[0129] This embodiment provides a Si 3 N 4 and Ni 3 N 2 Structured atmospheric high temperature resistant, salt spray resistant solar selective absorption coating, divided into the first layer of diffusion barrier layer, the second layer of infrared emission layer, the third layer of diffusion barrier layer, the fourth layer of absorption layer, the fifth layer of anti-reflection layer, the sixth organic protective layer.
[0130] The first layer is Si 3 N 4 film, the thickness is 60nm, the second layer is Cu film, the thickness is 180nm, and the third layer is Si 3 N 4 film, the thickness is 60nm, the total thickness of the fourth layer is 160nm, wherein the thickness of the first sublayer is 100nm, the thickness of the second sublayer is 60nm, and the Si in the first sublayer 3 N 4 The volume percentage is 40%, the rest is Ni 3 N 2 ; the second sublayer Si 3 N 4 The volume percentage is 60%, the rest is Ni 3 N 2 ; The fifth layer is SiO 2 film with a thickness...
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