Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method for preparing stealthy fabric with double functions of radar stealth and infrared stealth

A radar stealth, dual-function technology, applied in the field of absorbing materials, can solve problems such as unsatisfactory bonding fastness, achieve good visible light stealth effect, and improve the effect of bonding fastness

Active Publication Date: 2014-09-24
江苏华宏昌明科技有限公司
View PDF6 Cites 35 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The technical problem to be solved by the present invention is: for stealth textiles with multi-layer coatings, there is the problem of "unsatisfactory bonding fastness between coatings and fabrics, between coatings and coatings",

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for preparing stealthy fabric with double functions of radar stealth and infrared stealth
  • Method for preparing stealthy fabric with double functions of radar stealth and infrared stealth
  • Method for preparing stealthy fabric with double functions of radar stealth and infrared stealth

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0031] (1) Cotton fabric is placed on the shelf in the chamber of DT-01 low-temperature plasma processing machine (Suzhou Opus Plasma Technology Co., Ltd.), and the vacuum pump is turned on. When the vacuum in the reaction chamber is 5Pa, oxygen is introduced. , adjust the flow rate of oxygen until the vacuum degree in the reaction chamber is 20Pa, glow discharge (discharge power 100W, discharge time 10min), after the discharge is over, turn off the oxygen switch, feed acrylic acid monomer steam, under the vacuum degree of 30Pa, glow discharge Light discharge (discharge power 50W, discharge time 30min), after discharge, deionized water ultrasonic cleaning 3 times, 50 ℃ drying, standby;

[0032] (2) Add aniline monomer to 0.5mol / L hydrochloric acid solution to prepare 1mol / L aniline solution, heat the aniline hydrochloric acid solution to 50°C, and add the aniline treated in step (1) at a bath ratio of 1:20 For textiles, after soaking for 120 minutes, take them out, roll them a...

Embodiment 2

[0042] (1) Cotton fabric is placed on the shelf in the chamber of DT-01 low-temperature plasma processing machine (Suzhou Opus Plasma Technology Co., Ltd.), and the vacuum pump is turned on. When the vacuum in the reaction chamber is 5Pa, oxygen is introduced. , adjust the flow rate of oxygen until the vacuum degree in the reaction chamber is 60Pa, glow discharge (discharge power 250W, discharge time 5min), after the discharge is over, turn off the oxygen switch, and feed the methacrylic acid monomer vapor, under the vacuum degree of 50Pa , glow discharge (discharge power 150W, discharge time 10min), after discharge, deionized water ultrasonic cleaning 5 times, 80 ℃ drying, standby;

[0043] (2) adding the aniline monomer (98% of the mass fraction of the aniline monomer, and 2% of the mass fraction of m-phenylenediamine) into a 2mol / L sulfuric acid solution to prepare a 2.5mol / L aniline monomer solution, Heating the sulfuric acid solution of aniline monomers to 80°C, adding th...

Embodiment 3

[0052] (1) Cotton fabric is placed on the shelf in the chamber of DT-01 low-temperature plasma processing machine (Suzhou Opus Plasma Technology Co., Ltd.), and the vacuum pump is turned on. When the vacuum in the reaction chamber is 5Pa, oxygen is introduced. , adjust the flow rate of oxygen until the vacuum degree in the reaction chamber is 40Pa, glow discharge (discharge power 150W, discharge time 8min), after the discharge is over, turn off the oxygen switch, and feed the methacrylic acid monomer vapor, under the vacuum degree of 40Pa , glow discharge (discharge power 100W, discharge time 20min), after discharge, deionized water ultrasonic cleaning 4 times, 60 ℃ drying, standby;

[0053] (2) Add aniline monomers (96% of the mass fraction of aniline monomers, 4% o-phenylenediamine) into 1mol / L nitric acid solution, prepare 2mol / L aniline monomer solutions, and aniline monomers The nitric acid solution is heated to 70°C, and the textiles treated in step (1) are added in a ba...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Particle sizeaaaaaaaaaa
Reflectivityaaaaaaaaaa
Login to View More

Abstract

The invention belongs to the field of absorbing material research, and particularly relates to a method for preparing stealthy fabric with double functions of radar stealth and infrared stealth. According to the method, the binding strength of a radar stealth layer and textile is improved by using electrostatic interaction between plasma grafting-introduced carboxyl and polyaniline absorbing materials and the surface etching effect of low-temperature plasma; the binding strength of the radar and the infrared stealth layers and the textile is improved by using the reactivity between a binary aldehyde crosslinking agent and amino on a polyaniline polymer and a microcapsule wall material and a polyurethane adhesive; the obtained stealth coating is not only good in binding strength with the textile, but also light in quality and good in durability, and has multi-band stealth effects of radar, infrared light and visible light.

Description

technical field [0001] The invention belongs to the research field of wave-absorbing materials, and in particular relates to a preparation method of a stealth fabric with dual functions of infrared stealth and radar stealth. Background technique [0002] In recent years, with the advent of various advanced detection technologies and precision-guided weapons, the threats to military targets, weapons and combat soldiers on the battlefield have become increasingly serious. Stealth technology, as an important means to improve the survivability of weapons and equipment in war, has been paid more and more attention by countries all over the world. [0003] According to different detection technologies, stealth technology can be divided into: radar stealth, infrared stealth, laser stealth, acoustic stealth and visible light stealth, etc. At present, in military detection, radar detection accounts for about 60%, infrared detection accounts for 30%, and other 10%. Therefore, the cu...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): D06M23/12D06M11/83D06M11/44D06M11/49D06M11/45D06M11/48D06M13/123D06M15/61D06M10/08D06M10/10
Inventor 彭勇刚纪俊玲周永生汪媛
Owner 江苏华宏昌明科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products