A kind of preparation method of n-type double-sided solar cell
A solar cell and double-sided technology, applied in the field of solar cells, can solve problems such as poor effect of blocking diffusion, increase in process steps and difficulty, increase in production cost of cell sheets, etc., and achieve simple and easy preparation methods, low cost, and improved The effect of capacity
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0032] A method for preparing an N-type double-sided solar cell, comprising the steps of:
[0033] (1) cleaning, cashmere;
[0034] (2) Print boron paste on the front side of the silicon wafer, and then dry it;
[0035] The drying temperature is 200°C and the drying time is 10 minutes;
[0036] (3) Phosphorus paste is printed on the back of the silicon wafer, and then dried;
[0037] The drying temperature is 200°C and the drying time is 10 minutes;
[0038] (4) Pasting the above-mentioned 40 silicon wafers face-to-face, so that the pastes on the facing surfaces are the same to form a silicon wafer group;
[0039] (5) Put the above-mentioned silicon wafer group into a diffusion furnace, and process it at 935° C. for 45 minutes;
[0040] (6) Use hydrofluoric acid with a volume concentration of 7% to clean the side oxide layer of the above-mentioned silicon wafer group at room temperature, and the cleaning time is 250 seconds;
[0041] Then, the tetramethylammonium hydroxid...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More 