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Colloid-based photonic crystal anti-fake pattern preparation method

A technology of colloidal photonic crystals and colloidal particles, which is applied in the reproduction/marking method, the printing and printing of special varieties of printed matter, can solve the problems of long technology generation time, complicated operation steps, cracking and imitation, etc., and achieve convenient and fast detection. , Simple preparation, low cost effect

Inactive Publication Date: 2014-12-03
SOUTHEAST UNIV
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AI Technical Summary

Problems solved by technology

[0004] At present, there are many anti-counterfeiting technologies in real life, such as fluorescent ink anti-counterfeiting, seal anti-counterfeiting, digital holography and other anti-counterfeiting technologies. Although these technologies have relatively common applications, they are easy to be cracked and imitated by counterfeiters due to their long-term production time. , and there are disadvantages such as complicated operation steps and high cost, so it is necessary to develop new anti-counterfeiting technology

Method used

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  • Colloid-based photonic crystal anti-fake pattern preparation method

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Embodiment 1

[0038] Example 1: Preparation of colloidal photonic crystal anti-counterfeiting patterns

[0039] 1. Preparation of colloidal photonic crystal solution:

[0040] Add monodisperse solid silica colloidal nanoparticles with a diameter of 220nm into a mixture of ultrapure water and ethylene glycol with a volume ratio of 4:1, adjust the mass fraction of silica to 20%, and ultrasonically disperse;

[0041] 2. One-time processing of the printed substrate

[0042] Choose the smooth surface of a single-sided polished silicon wafer as the printing substrate. After the silicon wafer is cleaned and treated with a plasma instrument to make the contact angle 0°, it is placed in a sealed glass dish with a diameter of 1dm, and 300ul propyl triethoxylate is added. base silane (triethoxypropylsilane), heated at 60°C for 1h, and treated its contact angle to 50°;

[0043]3. Ink printing

[0044] Use the colloidal photonic crystal solution prepared in step 1 as ink to inject into the ink cartri...

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Abstract

The invention discloses a colloid-based photonic crystal anti-fake pattern preparation method which comprises the following steps: colloid particles are dispersed in ultrapure water containing ethylene glycol to prepare colloid particle solution; then, an ink-jet printer is utilized to print the colloid particle solution on a hydrophilic substrate (3) to form a first-layer colloid photonic crystal (1), and a pattern is formed when the first-layer colloid photonic crystal is dried; the substrate with the pattern is processed into a hydrophobic substrate, the other pattern is printed through a secondary printing to form a second-layer colloid photonic crystal (2), and the two patterns are combined to obtain the colloid-based photonic crystal anti-fake pattern with the anti-fake function. When observed at different angles, the anti-fake pattern can display color variety according to different observation angles, so that the anti-fake purpose is realized.

Description

technical field [0001] The invention relates to a method for preparing an anti-counterfeiting pattern based on colloidal photonic crystals, in particular to a colloidal photonic crystal anti-counterfeiting mark with observation angle response performance and a preparation method thereof. Background technique [0002] Photonic crystals are a kind of material with photonic bandgap characteristics in which the dielectric constant is periodically distributed in space. Light of a specific wavelength cannot pass through photonic crystals and be reflected back. Due to the long-range orderly arrangement of colloidal particles, colloidal crystals produce Photonic band gap. The photonic band gap follows the Bragg diffraction formula, that is, mλ=2ndsinθ, where m is the diffraction order, λ is the diffraction wavelength, n is the average refractive index of the colloidal crystal, d is the lattice spacing of the colloidal crystal, and θ is the incident light angle. It can be seen that ...

Claims

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Application Information

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IPC IPC(8): B41M3/14B41M5/00
Inventor 顾忠泽汪伟谢卓颖
Owner SOUTHEAST UNIV
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