Preparation method of titanium dioxide superhydrophobic film
A titanium dioxide and super-hydrophobic technology, applied in the direction of titanium dioxide, titanium oxide/hydroxide, etc., can solve the problems of synchronous construction of thin films, long preparation cycle, complex process, etc., and achieve excellent hydrophobicity, regular rough structure and repeatability Good results
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[0031] The method for preparing a titanium dioxide super-hydrophobic film of the present invention specifically includes the following steps:
[0032] Step 1: Preparation of titanium dioxide photosensitive sol
[0033] Add benzoylacetone to methanol to dissolve, and then add a certain amount of butyl titanate. The mass ratio of butyl titanate: benzoylacetone: methanol is 1:0.5~1:10~20. After sealing, stir at room temperature for 2~ 5h, get TiO 2 Photosensitive sol; the viscosity of the sol can be adjusted by adding polyethylene glycol 200 (PEG-200), the mass fraction of polyethylene glycol 200 is TiO 2 0.1%~0.8% of the total weight of the photosol;
[0034] Step 2: Preparation of titanium dioxide xerogel film
[0035] Dip the clean silicon wafer into the titanium dioxide photosensitive sol obtained in step 1, and draw a smooth and flat sol-gel film on the silicon wafer by dipping and pulling at a speed of 0.005~0.025cm / s, and then drying , The drying temperature is 80-100℃, and the t...
Example Embodiment
[0042] Example 1
[0043] Step 1: Preparation of titanium dioxide photosensitive sol
[0044] In a closed glove box with a relative humidity of not more than 40%RH and normal temperature and pressure, add benzoylacetone to methanol to dissolve, and then add a certain amount of butyl titanate, butyl titanate: benzoylacetone: methanol The ratio is 1:0.5:10. After sealing, stir for 2h at room temperature on a magnetic stirrer to obtain light yellow TiO 2 Transparent photosensitive sol;
[0045] Step 2: Preparation of titanium dioxide xerogel film
[0046] Dip the clean silicon wafer into the titanium dioxide photosensitive sol obtained in step 1, and draw a smooth and flat sol-gel film on the silicon wafer at a pulling speed of 0.005 cm / s by dipping and pulling, and then at a temperature of 80°C Dry for 10 minutes to obtain a titanium dioxide xerogel film;
[0047] Step 3: Preparation of titanium dioxide film with regular micron-level lattice rough surface
[0048] Fix the titanium dioxid...
Example Embodiment
[0052] Example 2
[0053] Step 1: Preparation of titanium dioxide photosensitive sol
[0054] In a closed glove box with a relative humidity of not more than 40%RH and normal temperature and pressure, add benzoyl acetone to methanol to dissolve, and then add a certain amount of butyl titanate, butyl titanate: benzoyl acetone: methanol The ratio is 1:0.75:15. After sealing, stir at room temperature on a magnetic stirrer for 3.5 hours, then add 0.45% of the total weight of the sol PEG-200, and continue stirring for 0.5 hours to obtain light yellow TiO 2 Transparent photosensitive sol;
[0055] Step 2: Preparation of titanium dioxide xerogel film
[0056] Dip the clean silicon wafer into the titanium dioxide photosensitive sol obtained in step 1, and draw a smooth and flat sol-gel film on the silicon wafer at a pulling speed of 0.015 cm / s by dipping and pulling, and then at a temperature of 90°C Dry for 7.5 minutes to obtain a titanium dioxide xerogel film;
[0057] Step 3: Preparation o...
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