Method for forming amphoteric ion structure on surface of separation membrane and separation membrane

A zwitterion and surface structure technology, applied in the field of separation membranes, can solve the problems of destroying the separation skin structure, damaging the rejection rate of separation membranes such as RO membranes and NF membranes, and water flux, etc. simple method effect

Inactive Publication Date: 2014-12-24
ZHEJIANG UNIV
View PDF4 Cites 19 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Because the surface separation skins of polyamide RO membranes and NF membranes are relatively fragile, current methods can easily destroy their separation skin structures, thereby damaging the rejection rate and water flux of separation membranes such as RO membranes and NF membranes.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for forming amphoteric ion structure on surface of separation membrane and separation membrane
  • Method for forming amphoteric ion structure on surface of separation membrane and separation membrane
  • Method for forming amphoteric ion structure on surface of separation membrane and separation membrane

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0040] (1) Configure an aqueous solution of positively charged substances, which contains 0.03g / mL of hyperbranched polyethyleneimine, 0.0025g / mL of EDC (1-ethyl-(3-dimethylaminopropyl) carbodiethylene amine hydrochloride) and 0.004 g / mL of NHS (N-hydroxysuccinimide).

[0041] (2) Configure an aqueous solution of negatively charged substances, which contains 0.03g / mL of acrylic acid and 0.0003g / mL of p-benzoquinone, wherein p-benzoquinone is used as a polymerization inhibitor of acrylic acid to prevent acrylic acid from occurring in the reaction process. polyreaction.

[0042] (3) Under normal temperature and pressure, the polyamide reverse osmosis membrane was immersed in the solution of positively charged substances for 4 hours, and the amino group on the hyperbranched polyethyleneimine and the polyamide RO membrane (polyamide reverse osmosis membrane) were catalyzed by EDC / NHS. ) reacted with the carboxyl groups on the surface, so that a large amount of positively charged ...

Embodiment 2

[0047] (1) Prepare an aqueous solution of a positively charged substance, which contains 0.05 g / mL of tetraethylenepentamine, 0.0025 g / mL of EDC and 0.004 g / mL of NHS.

[0048] (2) Configure an aqueous solution of negatively charged substances, which contains 0.03g / mL of acrylic acid and 0.0003g / mL of p-benzoquinone, wherein p-benzoquinone is used as a polymerization inhibitor of acrylic acid to prevent acrylic acid from occurring in the reaction process. polyreaction.

[0049] (3) Under normal temperature and pressure, the polyamide reverse osmosis membrane is immersed in the solution of positively charged substances for 4 hours, and the amino group on the tetraethylenepentamine reacts with the carboxyl group on the surface of the polyamide RO membrane under the catalysis of EDC / NHS, so that A large amount of positively charged tetraethylenepentamine was grafted on the surface of polyamide RO membrane.

[0050] (4) Rinse the polyamide RO membrane grafted with tetraethylenepe...

Embodiment 3

[0053] (1) Prepare an aqueous solution of a positively charged substance, which contains 0.005g / mL of 4-amino-3-hydrazino-5-mercapto-1,2,4-triazole, 0.0025g / mL of EDC and 0.004g / mL of NHS.

[0054] (2) Configure an aqueous solution of negatively charged substances, which contains 0.03g / mL of acrylic acid and 0.0003g / mL of p-benzoquinone, wherein p-benzoquinone is used as a polymerization inhibitor of acrylic acid to prevent acrylic acid from occurring in the reaction process. polyreaction.

[0055] (3) Immerse the polyamide reverse osmosis membrane in the solution of positively charged substances for 5 hours at normal temperature and pressure, and 4-amino-3-hydrazino-5-mercapto-1,2,4-tri The amino group on the azole reacts with the carboxyl group on the surface of the polyamide RO membrane, so that a large number of positively charged 4-amino-3-hydrazino-5-mercapto-1,2,4- Triazole.

[0056] (4) Rinse the polyamide RO membrane grafted with 4-amino-3-hydrazino-5-mercapto-1,2...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to view more

Abstract

The invention discloses a method for forming an amphoteric ion structure on the surface of a separation membrane. The method comprises the following steps: (1) immersing the separation membrane in a solution containing positively charged substances, wherein the positively charged substances react with active groups on the surface of the separation membrane to realize the grafting of the positively charged substances onto the surface of the separation membrane; and (2) washing the separation membrane with the surface being grafted with the positively charged substances, and immersing the separation membrane in a solution containing negatively charged substances, wherein the negatively charged substances have Michael addition reaction with the positively charged substances on the surface of the separation membrane so as to be grafted to the surface of the separation membrane to obtain an ampphoteric ion modified separation membrane. The invention also discloses a modified membrane prepared by the method. The method for forming the amphoteric ion structure on the surface of the separation membrane is carried out under the normal temperature and normal pressure, only the separation membrane needs to be immersed in the positively charged substance solution and the negatively changed substance solution, the reaction conditions are moderate, the preparation steps are simple, and therefore industrialization can be achieved easily.

Description

technical field [0001] The invention relates to the field of membrane technology, in particular to a method for constructing a zwitterionic structure on the surface of a separation membrane and a separation membrane prepared by the method. Background technique [0002] Membrane separation technology is an efficient, environmentally friendly and energy-saving separation method, including reverse osmosis (RO), nanofiltration (NF), microfiltration (MF), ultrafiltration (UF) and other technologies, which are widely used in seawater desalination, sewage In the fields of processing, food, medicine, biology, chemical industry, electronics, energy, etc., the core is the separation membrane. However, in industrial applications, the separation membrane has the disadvantage of being easily fouled, resulting in reduced flux and shortened membrane life, which will eventually significantly increase the cost of additional cleaning procedures and membrane separation processes. [0003] In ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): B01D71/56B01D67/00
Inventor 张林秦嘉旭侯立安
Owner ZHEJIANG UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap