Policresulen suppository
A technology of polycresol suppository and polycresol suppository, which is applied in the field of medicine, can solve the problems of easy melting, dead angle of medication, and discomfort of patients, and achieve the effect of stable product quality, no foreign body sensation, and comfortable feeling
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0033] Policresulen 60mg
[0034] Polyoxyethylene 10000 2g
[0035] Polyoxyl stearate (40) 1.4g
[0036] Preparation Process:
[0037] Polyoxyethylene 10000 was heated to 65°C to melt, filled into suppository blister, and cooled at 10°C to form;
[0038] The polyoxyl stearate (40) was heated to 40°C to melt, added with polycresol, stirred evenly, filled into a suppository blister containing polyoxyethylene, cooled at 8°C, and formed.
Embodiment 2
[0040] Policresulen 120mg
[0041] Polyoxyethylene 30000 2g
[0042] Polyoxyl stearate (40) 0.6g
[0043] Preparation Process:
[0044] Polyoxyethylene 30000 was heated to 70°C to melt, filled into suppository blister, and cooled at 8°C to form;
[0045] The polyoxyl stearate (40) was heated to 42°C to melt, added with polycresol, stirred evenly, filled into a suppository blister containing polyoxyethylene, cooled at 6°C, and formed.
Embodiment 3
[0047] Policresulen 120mg
[0048] Polyoxyethylene 30000 2g
[0049] Polyoxyl stearate (40) 0.3g
[0050] Preparation Process:
[0051] Polyoxyethylene 30000 was heated to 70°C to melt, filled into suppository blister, and cooled at 8°C to form;
[0052] The polyoxyl stearate (40) was heated to 42°C to melt, added with polycresol, stirred evenly, filled into a suppository blister containing polyoxyethylene, cooled at 6°C, and formed.
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com