Technique for extracting copper ions from industrial wastewater
A technology for industrial wastewater and copper ions, which is applied in ion exchange water/sewage treatment, copper sulfate, water pollutants, etc., can solve problems such as heavy metal ion pollution, achieve environmental protection, increase extraction rate, and simple arsenic removal process Effect
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Embodiment 2
[0032] A process for extracting copper ions from industrial waste water, comprising the following steps:
[0033] 1) Pretreating the acidic copper-containing etching waste liquid and the alkaline copper-containing etching waste liquid to remove suspended impurities and arsenic pollutants respectively;
[0034] 1-1) Pretreatment for removing arsenic pollutants from acidic copper-containing etching waste liquid:
[0035] Add 8g KMnO to every 1000mL acidic copper-containing etching waste solution 4 reagent dosing method, and add 80mL concentration of 12.0% NH 3 ·H 2 O, stirred for 20 minutes, and stood still for 45 minutes; under this condition, the removal effect of arsenic reached the best, which could reach 98%;
[0036] 1-2) Pretreatment of alkaline copper-containing etching waste liquid to remove arsenic pollutants: adding 1.2 g of magnesium chloride to every 1000 grams of alkaline copper-containing etching waste liquid;
[0037] 2) Neutralization and precipitation: neut...
Embodiment 3
[0043] A process for extracting copper ions from industrial waste water, comprising the following steps:
[0044] 1) Pretreating the acidic copper-containing etching waste liquid and the alkaline copper-containing etching waste liquid to remove suspended impurities and arsenic pollutants respectively;
[0045] 1-1) Pretreatment for removing arsenic pollutants from acidic copper-containing etching waste liquid:
[0046] Add 8g KMnO to every 1000mL acidic copper-containing etching waste solution 4 The reagent dosing method, and add 80mL concentration of 12.0% NH 3 ·H 2 O, stirred and reacted for 20 minutes, and stood still for 45 minutes; under this condition, the removal effect of arsenic reached the best, which could reach 98%;
[0047] 1-2) Pretreatment of alkaline copper-containing etching waste liquid to remove arsenic pollutants: adding 1.2 g of magnesium chloride to every 1000 grams of alkaline copper-containing etching waste liquid;
[0048]2) Neutralization and prec...
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