Method for rapid preparation of high-purity yttrium oxide coating for plasma etching machine

A plasma, yttrium oxide technology, applied in coating, metal material coating process, melt spraying and other directions, can solve the problems of large heat input, slow coating speed, low coating purity and uniformity, etc. Longevity, high bond strength, high resistance to high-energy plasma erosion performance

Inactive Publication Date: 2015-02-18
BEIJING GENERAL RES INST OF MINING & METALLURGY +1
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AI Technical Summary

Problems solved by technology

[0007] The purpose of the present invention is to provide a thermal spraying method capable of rapidly preparing high-purity yttrium oxide ceramic coatings,

Method used

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  • Method for rapid preparation of high-purity yttrium oxide coating for plasma etching machine

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[0014] Before spraying, sandblasting and ultrasonic cleaning are used to remove surface oxides and attached impurities.

[0015] Firstly, the parts are fixed in a proper way, the surface is dried with pure compressed air, and the non-coated part of the substrate is protected with a special protective tape for thermal spraying.

[0016] Thoroughly clean the powder feeder, powder feed tube, spray gun, and keep the spraying environment clean and pollution-free. Maintain a large amount of exhaust and dust removal during the spraying process to ensure that a high-purity yttrium oxide coating is obtained.

[0017] The high-purity yttrium oxide ceramic powder produced by Beijing General Research Institute of Mining and Metallurgy (or with equivalent performance parameters) is used, and the process parameters shown in Table 1 are used for spraying.

[0018] Finally, remove the protective tape of the parts, thoroughly clean the equipment and environmental sanitation, and complete the spraying p...

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Abstract

The invention discloses a method for rapid preparation of a high-purity yttrium oxide coating for a plasma etching machine. The method comprises the following steps: 1) preprocessing the surface of a part to be sprayed and protecting a coating-free region with an adhesive tape; 2) adopting high-purity yttrium oxide powder produced by Beijing General Research Institute of Mining and Metallurgy (or withmequal performance parameter), wherein the purity of the yttrium oxide powder is more than or equal to 99.9% and grain distribution is 20-40 microns; and 3) rapidly spraying by virtue of a scheme combining a tri-anode plasma spraying system and a multi-shaft manipulator. Compared with a conventional plasma spraying method, by adopting the spraying method disclosed by the invention, the heat input of a substrate (substrate temperature is less than 100 DEG C) is effectively reduced and the purity and uniformity of the coating is improved; the high-purity yttrium oxide ceramic coating which is 120-180 microns thick and is more than or equal to 99% in purity can be rapidly prepared within 1-2min; and high-energy plasma erosion resistance and service life of an etching machine part of a large scale integrated circuit are enhanced.

Description

technical field [0001] The invention relates to a method for rapidly preparing a ceramic covering layer, in particular to a method for rapidly preparing a high-purity yttrium oxide coating for a plasma etching machine. Background technique [0002] With the increase in volume of semiconductor silicon wafer processing equipment and the increase in processing plasma power, the protective coating material on the surface of aluminum parts in the plasma reaction chamber of an extremely large-scale integrated circuit etching machine can be used in high-power CF 4 , SF 6 , O 2 , Cl 2 , The lifetime under HBr plasma erosion is reduced. When the size of the processed silicon wafer increases to 12 inches, the traditional alumina coating has poor resistance to high-power plasma erosion and cannot meet the requirements. [0003] Because yttrium oxide coating has better plasma erosion resistance and longer service life than aluminum oxide, it has become the development trend of coati...

Claims

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Application Information

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IPC IPC(8): C23C4/10C23C4/12C23C4/11C23C4/134
Inventor 于月光冀晓鹃侯伟骜任先京沈婕冀国娟酉琪
Owner BEIJING GENERAL RES INST OF MINING & METALLURGY
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