Resin composition used for packaging semiconductor, semiconductor device with hardening substance thereof, and method for manufacturing semiconductor device
A resin composition and semiconductor technology, which can be used in semiconductor devices, semiconductor/solid-state device parts, and electric solid-state devices, etc., can solve the problems of decreased adhesion of CuLF or Ag plating, insufficient heat resistance, and thermal decomposition, etc. Achieve excellent adhesion, less thermal decomposition, and excellent adhesion
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[0149] Hereinafter, examples and comparative examples are shown, and the present invention will be described in more detail, but the present invention is not limited to the following examples. In addition, the part in each example is a mass part.
[0150] [Example and Comparative Example]
[0151] Prepare the following components with the compositions shown in Table 1 to Table 4, mix them uniformly with a high-speed mixer, knead them uniformly with two heated rollers, cool them, and pulverize them to obtain a resin composition .
[0152] [Components (A) to (C) used in the first composition, the second composition, and the third composition]
[0153] (A) Cyanate compound
[0154] (a) Cyanate compound represented by the following formula (5) (Primaset (Primaset) PT-60, manufactured by Lonza Japan Co., Ltd., cyanoxy group equivalent: 119)
[0155] [chemical 13]
[0156]
[0157] (b) Cyanate compound obtained in Synthesis Example 1 below
Synthetic example 1
[0159] 100 g of phenol compound MEH-7851SS (manufactured by Meiwa Kasei) was dissolved in 600 g of butyl acetate. The solution was cooled to about -15°C, and 32 g of gaseous cyanogen chloride was introduced. Next, 50 g of triethylamine was added dropwise with stirring over about 30 minutes while maintaining the temperature at -10°C or lower. After a further 30 minutes at the temperature, the cooling was stopped and the reaction mixture was filtered. The filtrate is then passed to an ion exchanger packed column. Next, the solvent was removed under reduced pressure at a bath temperature of 70°C, followed by removal of volatile impurities (including solvent residues, free triethylamine, di ethyl cyanamide). The obtained product was a cyanate compound represented by the following formula (6) (cyanoxy group equivalent weight: 208).
[0160] [chemical 14]
[0161]
[0162] (B) Phenolic compounds
[0163] (c) A phenolic compound represented by the following formula (7) (MEH-...
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