Method for regulating and controlling ion beam sputtered silicon dioxide optical membrane stress

A technology of ion beam sputtering and silicon dioxide, applied in sputtering plating, ion implantation plating, coating, etc., can solve problems such as low stress characteristics
CN104480428AInactive Publication Date: 2015-04-01THE 3RD ACAD 8358TH RES INST OF CASC
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
THE 3RD ACAD 8358TH RES INST OF CASC
Publication Date
2015-04-01
Estimated Expiration
Not applicable · inactive patent

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Abstract

The invention belongs to the technical field of silicon dioxide optical membrane stress regulation, and in particular relates to a method for regulating and controlling ion beam sputtered silicon dioxide optical membrane stress. According to the method, the size of oxygen flow in the ion beam sputtering process is adjusted so as to control the stress of an SiO2 membrane on the premise that the on-crystal micro structure and the optical property of the membrane are ensured, and thus the method is applied to the fields of super-low consumption laser membranes and high-damage threshold laser membranes. According to the scheme, after a substrate is subjected to chemical washing, ultrasonic wave washing and ion beam bombardment washing in sequence, the size of the oxygen flow is adjusted under the condition that other parameters are not changed in the preparation process, so that the stress of a prepared silicon dioxide membrane is effectively controlled, and the silicon dioxide membrane can meet the application in the fields such as super-low consumption laser membranes and high-damage threshold laser membranes.
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Description

technical field

[0001] The invention belongs to the technical field of adjusting the stress of silicon dioxide optical thin films, and in particular relates to a method for regulating and controlling the stress of silicon dioxide optical thin films by ion beam sputtering applied in low-loss and anti-laser damage threshold thin film technology. Background technique

[0002] SiO 2 Thin film is an important nano-film material, which has the advantages of wide transparent area (0.15 μm ~ 8 μm), low refractive index, high hardness, low thermal expansion coefficient, electrical insulation, friction resistance, acid and alkali resistance, and corrosion resistance. It is used in the fields of optical thin film components, semiconductor integrated circuits, electronic devices, sensors, laser devices, chemical catalysis, biomedicine, surface modification and pharmaceutical packaging. In the field of optical thin films, SiO 2 Thin film is one of the essential low refractive index mate...

Claims

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