Initiator-containing abrasive particle-free polishing solution composition for memory hard disk substrate and preparation method thereof

Abstract

The invention discloses an initiator-containing abrasive particle-free polishing solution composition for a memory hard disk substrate. The initiator-containing abrasive particle-free polishing solution composition comprises 0.01-0.12% of an azo initiator, 1.0-6.0% of an oxidizing agent hydrogen peroxide, 1.0-4.0% of a dispersant sodium hexametaphosphate, 1.0-4.0% of a surfactant polyoxypropylene cetyl ether carboxylate and the balance deionized water. The preparation method of the polishing solution composition comprises the following steps of weighing raw materials according to a formula of the polishing solution composition, orderly adding the initiator, the dispersant and the surfactant into the deionized water with stirring, and after stirring dissolution, adding the oxidizing agent into the solution with continuous stirring to obtain a transparent liquid which is the polishing solution composition. The polishing solution composition does not contain particles, contains the initiator, is especially suitable for polishing a Ni-P-coated computer hard disk substrate, can improve a substrate removal rate, can reduce surface microscopic scratches and pits and can improve hard disk substrate surface flatness.

Description

technical field [0001] The invention relates to a polishing liquid and a preparation method thereof, in particular to a non-abrasive polishing liquid for a hard disk substrate and a preparation method thereof, which are applied in the technical field of computer memory hard disk manufacturing and surface polishing. Background technique [0002] In recent years, with the rapid development of information technology, the capacity and storage density of memory hard disks have increased rapidly at a rate of 100-200% per year, and computer hard disks are developing in the direction of larger capacity, smaller volume and lower cost. The magnetic head reads smaller and weaker signals, so the distance between the magnetic head and the magnetic medium of the disk needs to be further reduced to increase the strength of the output signal. At present, the flying height of commercialized computer heads has been reduced to about 3 nanometers. As the magnetic head and the magnetic disk run...

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Problems solved by technology

[0003] The traditional chemical mechanical polishing (CMP) technology is an important means of computer hard disk processing at present. It realizes the removal of materials and the flattening of the surface of the workpiece under the combination of chemical and mechanical effects. Although the material removal rate of the workpiece is high, the polishing process Due to the high hardness of nano-abrasive particles, easy agglomeration, and poor dispersion, the surface of the workpiece is prone to damage such as dents, corrosion, micro-scratches, and particle residues. However, it cannot well meet the current requirements for the surface smoothing process of atomic-level materials on the surface of hard disks.

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