Encapsulation structure and encapsulation method of organic light emitting diode device
An electroluminescent device and packaging structure technology, applied in the direction of electro-solid devices, electrical components, semiconductor devices, etc., can solve the problems of loss of desiccant absorption capacity, decreased device life, easy to generate cracks, etc., to achieve good step coverage and The effect of large area thickness uniformity, small influence and strong adhesion
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Embodiment 1
[0058] figure 1 It is a schematic diagram of the packaging structure of the organic electroluminescent device in Example 1; as figure 1 As shown, the packaging structure of the organic electroluminescent device includes an ITO glass substrate 11, an organic light-emitting functional layer 12, a cathode 13 and a thin film encapsulation layer 20; the thin film encapsulation layer 20 includes five germanium oxynitride film layers 21 and inorganic barrier The encapsulation unit composed of layer 22.
[0059] A method for encapsulating an organic electroluminescent device, comprising the steps of:
[0060] (1) Pre-treatment of ITO glass substrate (11): First, clean the ITO glass with acetone, ethanol, deionized water, and ethanol in sequence, all of which are cleaned with an ultrasonic cleaner. dry, oven dry stand-by; then surface activation treatment is carried out to the cleaned ITO glass, to increase the oxygen content of the conductive surface layer, improve the work function...
Embodiment 2
[0076] A method for encapsulating an organic electroluminescent device, comprising the steps of:
[0077] (1), (2), (3) are the same as embodiment 1;
[0078] (4) Preparation of thin film encapsulation layer:
[0079] a) Preparation of germanium oxynitride film layer: the germanium oxynitride film layer was prepared on the cathode surface by plasma enhanced chemical vapor deposition (PECVD), the working pressure was 10Pa, the deposition temperature was 30°C, and the radio frequency power was 0.1W / cm 2 ; The gas source adopted in the process of depositing germanium oxynitride layer is hexamethyldigermanium amine (HMDG), ammonia gas (NH 3 ) and oxygen (O 2 ), the loading gas is argon (Ar); 3 ) flow rate of 18sccm, oxygen (O 2 ) flow rate is 18 sccm, the flow rate of argon gas (Ar) is 80 sccm, and the thickness of the germanium oxynitride film layer is 190 nm;
[0080] b) Preparation of inorganic barrier layer: Atomic layer deposition (ALD) was used to prepare an inorganic...
Embodiment 3
[0085] A method for encapsulating an organic electroluminescent device, comprising the steps of:
[0086] (1), (2), (3) are the same as embodiment 1;
[0087] (4) Preparation of thin film encapsulation layer:
[0088] a) Preparation of germanium oxynitride film layer: a germanium oxynitride film layer was prepared on the cathode surface by plasma enhanced chemical vapor deposition (PECVD), the working pressure was 50Pa, the deposition temperature was 50°C, and the radio frequency power was 0.5W / cm 2 ; The gas source adopted in the process of depositing germanium oxynitride layer is hexamethyldigermanium amine (HMDG), ammonia gas (NH 3 ) and oxygen (O 2 ), the loading gas is argon (Ar); the flow rate of hexamethyldigermanamine (HMDG) is 12 sccm, ammonia (NH 3 ) flow rate is 15sccm, oxygen (O 2 ) flow rate is 16 sccm, the flow rate of argon (Ar) is 76 sccm, and the thickness of germanium oxynitride film layer is 180nm;
[0089] b) Preparation of inorganic barrier layer: A...
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