An environmentally friendly cooling film for buildings based on photonic crystals
A photonic crystal and building technology, applied in building structures, buildings, layered products, etc., can solve the problems of ineffectiveness, neglect of visible light transmittance, limited use range, etc., and achieve the effect of widening the photonic band gap.
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Embodiment 1
[0035] Such as Figure 1-2As shown, an environmentally friendly cooling film for buildings based on photonic crystals, the cooling film includes a scratch-resistant and wear-resistant layer 1, an upper substrate layer 2, a photonic crystal cooling layer 3 and a lower substrate layer 4 from top to bottom, The anti-scratch and wear-resistant layer 1 is a polyurethane anti-scratch and wear-resistant layer, the upper substrate layer 2 and the lower substrate layer 4 are both polyethylene terephthalate substrate layers, and the photonic crystal cooling layer 3 is composed of the first composite layer , the second composite layer, the third composite layer and the fourth composite layer are stacked sequentially from top to bottom, and the structural formula is (AB) 4 (CD) 4 (EF) 4 (GH) 4 , the first composite layer is composed of 4 layers of A dielectric layer and 4 layers of B dielectric layer alternately superimposed on each other (AB) 4 Type composite structure, the second co...
Embodiment 2
[0042] In this embodiment, the total thickness of the photonic crystal cooling layer 3 is 2.352 μm, the refractive index of the silicon dioxide dielectric layer is 1.45, the titanium dioxide is anatase titanium dioxide, and the refractive index of the anatase titanium dioxide is 2.65.
[0043] The thickness of the A dielectric layer in the first composite layer is 52nm, the thickness of the B dielectric layer is 29nm; the thickness of the C dielectric layer in the second composite layer is 76nm, and the thickness of the D dielectric layer is 42nm; the E dielectric layer in the third composite layer The thickness of the F medium layer is 104nm, the thickness of the F medium layer is 57nm; the thickness of the G medium layer in the fourth composite layer is 147nm, and the thickness of the H medium layer is 81nm; the thickness of the scratch-resistant and wear-resistant layer 1 is 4μm; the upper substrate layer 2 It is equal to the thickness of the lower substrate layer 4, and the...
Embodiment 3
[0045] In this embodiment, the total thickness of the photonic crystal cooling layer 3 is 2.336 μm, the refractive index of the silicon dioxide dielectric layer is 1.45, the titanium dioxide is anatase titanium dioxide, and the refractive index of the anatase titanium dioxide is 2.65.
[0046] The thickness of the A dielectric layer in the first composite layer is 51.5nm, the thickness of the B dielectric layer is 28.5nm; the thickness of the C dielectric layer in the second composite layer is 75.5nm, and the thickness of the D dielectric layer is 41.5nm; the third composite layer The thickness of the medium E medium layer is 103.5nm, the thickness of the F medium layer is 56.5nm; the thickness of the G medium layer in the fourth composite layer is 146.5nm, and the thickness of the H medium layer is 80.5nm; the thickness of the scratch-resistant and wear-resistant layer 1 is 3 μm; the thickness of the upper substrate layer 2 and the lower substrate layer 4 are equal, and the th...
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