Glass polishing disk and manufacturing technique thereof

Abstract

The invention discloses a glass polishing disk and a manufacturing technique thereof and belongs to the technical field of abrasive substance. The polishing disk comprises curing agent, pore forming agent, padding, initiating agent, cleaning agent and abrasive particles, the abrasive particles are Fe2O3/SiO2 nanometer composite particles, and the padding comprises heat absorbent composed of sodium acetate trihydrate and sodium phosphate dibasic dodecahydrate. The manufacturing technique includes steps that 1, adding initiating agent-cobalt naphthenate, pore forming agent and heat absorbent to the curing agent; 2, adding the abrasive particles, initiating agent-cyclohexanone peroxied and cleaning agent; 3, pouring mixed slurry into a die, curing, and slicking the slurry. According to the glass polishing disk, the gap distribution in the polishing disk is uniform, the abrasive particle distribution is uniform, the workpiece polishing precision is high, the raw material cost is low, and the production technique is simple.

Description

technical field [0001] The invention relates to a polishing disc and a manufacturing process thereof, in particular to a glass polishing disc and a manufacturing process thereof, belonging to the technical field of abrasive materials. Background technique [0002] One of the core tools required for polishing glassware is the polishing disc. At present, the internal pores of the polishing discs produced in the market are unevenly distributed, and the hardness of the abrasive grains is high. Many of them are much higher than the hardness of glass products. For example, the polishing discs with alumina as abrasive grains are particularly easy to cause scratches on the glass surface hurt. The current polishing discs have poor wear resistance, and the temperature rises seriously during the polishing process, resulting in changes in the shape of the workpiece. The surface of the polished workpiece is prone to scratches and fried patterns, which seriously affects the polishing qua...

AI Technical Summary

Problems solved by technology

At present, the internal pores of the polishing discs produced in the market are unevenly distributed, and the hardness of the abrasive grains is high. Many of them are much higher than the hardness of glass products. For example, the polishing discs with alumina as abrasive grains are particularly easy to cause scratches on the glass surface hurt

The current polishing discs have poor wear resistance, and the temperature rises seriously during the polishing process, resulting in changes in the shape of the workpiece. The surface of the polished workpiece is prone to scratches and fried patterns, which seriously affects the polishing quality, polishing accuracy and polishing speed of the polished product.

Chinese patent CN102248495A discloses that the abrasive grains required for making the polishing disk are rare earth materials, and the production process is cumbersome and the cost is high; the raw materials required for making the polishing disk disclosed by Chinese patent CN102863903A include carbon nanotubes and caprolactam monomers, which are expensive and cost too high