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Fabricating method of 3D magnetic sensor

A technology of a magnetic sensor and a manufacturing method, which is applied in the manufacturing/processing of electromagnetic devices, instruments, measuring magnetic variables, etc., can solve problems such as affecting the process, device dirty spots, contamination of the machine, etc., and achieves a slight and reduced sputtering accumulation phenomenon. The effect of roughness

Active Publication Date: 2015-09-16
SHANGHAI HUAHONG GRACE SEMICON MFG CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

And this Ta-based polymer will not only pollute the machine, but also seriously affect the subsequent process, causing the generation of dirty spots on the device. Therefore, it is necessary to invent a process that can reduce or even completely remove the Ta-based polymer reverse deposition. Phenomenon

Method used

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  • Fabricating method of 3D magnetic sensor
  • Fabricating method of 3D magnetic sensor
  • Fabricating method of 3D magnetic sensor

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Effect test

Embodiment 1

[0044] Please refer to Figure 5 , and combined with Figures 6 to 11 , the present invention provides a kind of manufacturing method of 3D magnetic sensor, comprises the following steps:

[0045] Please refer to Figure 6 , provide a substrate 300, deposit an insulating layer 302 on the substrate 300, and make a trench 301 in the insulating layer 302, the depth of the trench 301 is smaller than the thickness of the insulating layer 302, that is to say, the bottom of the trench 301 Instead of the upper surface of the substrate 300, the trenches 301 provide sidewalls for forming the magnetoresistive layer of the 3D magnetic sensor.

[0046] Preferably, the material of the substrate 300 is silicon, germanium, or a layer of silicon covered on an insulator as the substrate.

[0047] The way to form the trench 301 is: use thermal oxidation growth or chemical vapor deposition process to form an insulating layer 302 on the substrate 300, cover the insulating layer 302 with a photo...

Embodiment 2

[0066] The difference between this embodiment and the first embodiment is that before depositing the magnetic material layer 303 , a diffusion barrier layer is deposited, and the diffusion barrier layer covers the insulating layer 302 and the bottom and sidewalls of the trench 301 .

[0067] Specifically, the material of the diffusion barrier layer is silicon nitride, and the formation method is chemical vapor deposition. The diffusion barrier layer can prevent the elements in the magnetic material layer 303 from diffusing into the insulating layer 302, especially metal ions, and avoid the insulation of the insulating layer 302. The effect is invalid.

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Abstract

The invention discloses a fabricating method of a 3D magnetic sensor. After an insulation layer is formed on a semiconductor substrate, an insulation layer gully is fabricated, a magnetic material layer, a TaN layer, an etching barrier layer, a filling material layer and a patterned photoresist layer are successively deposited then, vertical etching is performed on the etching barrier layer and part of the TaN layer then, and isotropic etching is performed on the residual TaN layer. A process step for etching the TaN layer and the etching barrier layer in the prior art is changed into the vertical etching performed on the etching barrier layer and the part of the TaN layer, the shape of the gully is guaranteed to be flat, and roughness of side walls is reduced. The isotropic etching is performed on the residual TaN layer using small bias-voltage power then, the etching mode can enable sputtered polymers to be uniformly distributed, accumulation of the polymers is reduced, the fact that the polymers are etched away is facilitated, and then the object of polymer deposition elimination is achieved; and pollution on a machine platform is then prevented through reduction in this way, and then the process yield is improved.

Description

technical field [0001] The invention relates to a manufacturing method of a magnetic sensor, in particular to a manufacturing method of a 3D magnetic sensor. Background technique [0002] A magnetic sensor is a device that can convert various magnetic fields and their changes into electrical signal output. Magnetic sensors include giant magnetoresistive sensors (Giant Magneto Resistive Sensor, GMR), isotropic magnetoresistive sensors (Anisotropic Magneto Resistive Sensor, AMR )Wait. Taking the isotropic magnetoresistive sensor as an example, the nickel-iron alloy layer is used as the magnetoresistive layer. When an external magnetic field is applied to the magnetoresistive layer, the magnetic domains of the magnetoresistive layer rotate, causing the resistance of the magnetoresistive layer to change, and the change in the resistance of the magnetoresistive layer is reflected in the change of the output voltage to achieve the purpose of detecting the external magnetic field....

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L43/12G01R33/09H10N50/01
Inventor 张振兴奚裴熊磊
Owner SHANGHAI HUAHONG GRACE SEMICON MFG CORP
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