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Nitrogen doped carbon/carbon nitride photocatalyst material and one-step synthesis method thereof

A technology of nitrogen-doped carbon and synthesis method, which is applied in the field of photocatalysis and can solve environmental hazards and other problems

Active Publication Date: 2016-01-27
中国科学院上海硅酸盐研究所苏州研究院
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the currently used copolymerization modification and organic compound semiconductors all use some organic compounds containing aromatic rings, such as pyrimidine, pyridine, polythiophene, etc. These substances are usually harmful to the environment.

Method used

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  • Nitrogen doped carbon/carbon nitride photocatalyst material and one-step synthesis method thereof
  • Nitrogen doped carbon/carbon nitride photocatalyst material and one-step synthesis method thereof
  • Nitrogen doped carbon/carbon nitride photocatalyst material and one-step synthesis method thereof

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preparation example Construction

[0020] Its concrete preparation method step is as follows:

[0021] 1) take a certain quality of urea and place it in a crucible, the quality of urea is 20g;

[0022] 2) Take a small amount of citric acid, and evenly disperse it in the urea weighed in step 1), the quality of citric acid is 10-1000mg;

[0023] 3) Cover the crucible in step 2, place it in a muffle furnace, and calcine it for 2-4 hours to obtain a nitrogen-doped carbon / carbon nitride photocatalyst material.

[0024] As a preferred solution, urea is used as the carbon nitride precursor.

[0025] As a preferred solution, a small amount of citric acid is used as the carbon source.

[0026] As a preferred solution, the calcination temperature in step 3) is 400-600° C., and the holding time is 2-4 hours.

[0027] The photocatalytic performance of nitrogen-doped carbon / carbon nitride photocatalysts was evaluated by splitting water to produce hydrogen under visible light (λ ≥ 420 nm). The experimental process is as ...

Embodiment 1

[0032] A kind of one-step synthetic method of nitrogen-doped carbon / carbon nitride photocatalyst is as follows: 1) take by weighing certain quality urea and place in crucible, the quality of urea is 20g; 2) take by weighing a small amount of citric acid, and evenly disperse to Step 1) In the weighed urea, the mass of citric acid is 20 mg; 3) Cover the crucible in step 2, place it in a muffle furnace, and calcinate at 550°C for 4 hours to obtain nitrogen-doped carbon / Carbon nitride photocatalyst material, denoted as CN-20.

Embodiment 2

[0034] In order to examine the effect of different citric acid additions on the photocatalytic performance of nitrogen-doped carbon / carbon nitride photocatalysts, except for the different additions of citric acid, other reaction conditions such as urea addition (20g), calcination temperature (550°C), Incubation time (4h) etc. are all identical with embodiment 1. The results show that: when the amount of citric acid added is 0mg (denoted as CN), when it is pure carbon nitride, its average photocatalytic hydrogen production is 14.5umolh -1 ; When the amount of citric acid added was 15mg (denoted as CN-15), its average photocatalytic hydrogen production was 44.9umolh -1 ; When the amount of citric acid added was 25mg (denoted as CN-25), its average photocatalytic hydrogen production was 39.3umolh -1 ; while in Example 1, when the amount of citric acid added was 20mg, its average photocatalytic hydrogen production was 63.7umolh-1 . This shows that the addition of citric acid to ...

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Abstract

The invention relates to a nitrogen doped carbon / carbon nitride photocatalyst material and a one-step synthesis method thereof. The one-step synthesis method comprises the following steps: citric acid is dispersed in urea in the mass ratio of citric acid to urea being 1: (20-2,000); a mixture is calcined, and the nitrogen doped carbon / carbon nitride photocatalyst material is obtained. The nitrogen doped carbon / carbon nitride photocatalyst material facilitates rapid separation of photo electrons and electron holes and improves the photocatalytic hydrogen generation performance effectively.

Description

technical field [0001] The invention relates to a nitrogen-doped carbon / carbon nitride photocatalyst material and a one-step method thereof, belonging to the technical field of photocatalysis. Background technique [0002] The large demand for clean and renewable energy in modern society has greatly stimulated the research on the photosynthesis of clean fuels. Photocatalytic materials have broad application prospects in photocatalytic decomposition of hydrogen and synthesis of solar fuels. Graphite carbon nitride (g-C 3 N 4 ) is a new type of organic semiconductor, which is a lamellar structure, mainly composed of two elements, carbon and nitrogen, which exist widely on the earth. A suitable energy band structure (~2.7eV) can absorb blue light in visible light and reduce hydrogen ions in water to hydrogen gas, so it can play an important role in solving environmental and energy problems. However, this metal-free organic semiconductor still has problems such as low light ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01J27/24
Inventor 周亚君张玲霞施剑林
Owner 中国科学院上海硅酸盐研究所苏州研究院
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