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A nitrogen-doped carbon/carbon nitride photocatalyst material and its one-step synthesis method

A technology of nitrogen-doped carbon and synthesis method, which is applied in the field of photocatalysis and can solve problems such as environmental hazards

Active Publication Date: 2017-07-14
江苏先进无机材料研究院
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the currently used copolymerization modification and organic compound semiconductors all use some organic compounds containing aromatic rings, such as pyrimidine, pyridine, polythiophene, etc. These substances are usually harmful to the environment.

Method used

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  • A nitrogen-doped carbon/carbon nitride photocatalyst material and its one-step synthesis method
  • A nitrogen-doped carbon/carbon nitride photocatalyst material and its one-step synthesis method
  • A nitrogen-doped carbon/carbon nitride photocatalyst material and its one-step synthesis method

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Experimental program
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preparation example Construction

[0020] Its specific preparation method steps are as follows:

[0021] 1) take a certain quality of urea and place it in the crucible, and the quality of the urea is 20g;

[0022] 2) take a small amount of citric acid, and evenly disperse it into the urea taken in step 1), the quality of citric acid is 10-1000mg;

[0023] 3) Cover the crucible in step 2, place it in a muffle furnace, and calcine it for 2-4 hours to obtain a nitrogen-doped carbon / carbon nitride photocatalyst material.

[0024] As a preferred solution, urea is used as the carbon nitride precursor.

[0025] As a preferred solution, a trace amount of citric acid is used as the carbon source.

[0026] As a preferred solution, the calcination temperature in step 3) is 400-600°C, and the holding time is 2-4h.

[0027] The photocatalytic performance of nitrogen-doped carbon / carbon nitride photocatalysts was evaluated by splitting water for hydrogen production under visible light (λ≥420 nm). The experimental procedu...

Embodiment 1

[0032] A one-step synthesis method of a nitrogen-doped carbon / carbon nitride photocatalyst is as follows: 1) weigh a certain mass of urea and place it in a crucible, and the quality of the urea is 20 g; 2) weigh a small amount of citric acid and evenly disperse it into the crucible. Step 1) In the weighed urea, the mass of citric acid is 20 mg; 3) Cover the crucible in step 2, place it in a muffle furnace, calcine at 550° C. for 4 hours, and then obtain nitrogen-doped carbon. / carbon nitride photocatalyst material, denoted as CN-20.

Embodiment 2

[0034] In order to examine the effect of different citric acid additions on the photocatalytic performance of nitrogen-doped carbon / carbon nitride photocatalysts, except for the different additions of citric acid, other reaction conditions such as urea addition (20 g), calcination temperature (550 °C), The holding time (4h) and the like are all the same as those in Example 1. The results show that when the amount of citric acid added is 0 mg (denoted as CN), that is, pure carbon nitride, the average photocatalytic hydrogen production is 14.5 umol h -1 ; When the amount of citric acid added was 15mg (denoted as CN-15), the average photocatalytic hydrogen production was 44.9umol h -1 ; When the amount of citric acid added was 25mg (denoted as CN-25), its average photocatalytic hydrogen production was 39.3umol h -1And in embodiment 1, when the addition amount of citric acid is 20mg, its average photocatalytic hydrogen production is 63.7umol h -1 . This indicates that the addit...

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Abstract

The invention relates to a nitrogen doped carbon / carbon nitride photocatalyst material and a one-step synthesis method thereof. The one-step synthesis method comprises the following steps: citric acid is dispersed in urea in the mass ratio of citric acid to urea being 1: (20-2,000); a mixture is calcined, and the nitrogen doped carbon / carbon nitride photocatalyst material is obtained. The nitrogen doped carbon / carbon nitride photocatalyst material facilitates rapid separation of photo electrons and electron holes and improves the photocatalytic hydrogen generation performance effectively.

Description

technical field [0001] The invention relates to a nitrogen-doped carbon / carbon nitride photocatalyst material and a one-step method thereof, belonging to the technical field of photocatalysis. Background technique [0002] The large demand for clean and renewable energy in modern society has greatly stimulated the research on photosynthesis of clean fuels. Photocatalytic materials have broad application prospects in photocatalytic decomposition of hydrogen to synthesize solar fuels. Graphitic carbon nitride (g-C 3 N 4 ) is a new type of organic semiconductor, which is a lamellar structure, mainly composed of two elements, carbon and nitrogen, which are widely present on the earth. Appropriate energy band structure (~2.7eV) can absorb blue light in visible light and reduce hydrogen ions in water to hydrogen, so it can play an important role in solving environmental and energy problems. However, this metal-free organic semiconductor still has problems such as low light uti...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B01J27/24
Inventor 周亚君张玲霞施剑林
Owner 江苏先进无机材料研究院
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