Methods for manufacturing block copolymers and articles manufactured therefrom
A technology of block copolymers and articles, applied in the field of block copolymers, which can solve the problem that the polarity conversion top coating cannot withstand high annealing temperature
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[0104] PS with number average molecular weights indicated by 13.5-b-13.5 kg / mol and 6.1-b-8.7 kg / mol are generally synthesized by the procedure described by Chang et al. in US Patent Publication 20130209344 and outlined below -b-PDMS block copolymer, wherein the first number corresponds to the number average molecular weight of the PS blocks and the second number corresponds to the number average molecular weight of the PDMS blocks. All other PS-b-PDMS block copolymers and PS and PDMS homopolymers were purchased from Polymer Source.
[0105] Synthesis of PS-b-PDMS Block Copolymer
[0106] Cyclohexane and styrene were added to a 500 mL round bottom reactor under argon atmosphere. The contents of the reactor were then warmed to 40°C. An injection of a 0.06M solution of sec-butyllithium in cyclohexane was then rapidly added to the reactor via cannula, turning the reactor contents yellow-orange. The reactor contents were stirred for 30 minutes. A small portion of the reactor c...
example 2
[0116] This example demonstrates the use of a composition (PS-b-PDMS-22) prepared according to Table 2 comprising a PS-b-PDMS composition with a domain spacing of 22 nm.
[0117] Table 2
[0118] polymer name
Composition / Mn(kg / mol)
wt% in composition
PDI
PS-b-PDMS
6.1-b-8.7
45
1.02
PS-b-PDMS
5.2-b-1.4
28
1.14
P.S.
6.0
8
1.05
PDMS
2.2
10
1.09
PDMS
3.5
9
1.12
[0119] By spin-coating a solution of hydroxyl-terminated poly(methylmethacrylate-ran-trifluoroethylmethacrylate) in propylene glycol monomethyl ether acetate (PGMEA), followed by a soft bake at 150 °C for 1 min And the silicon substrate with native oxide was treated by thermal annealing at 250° C. for 5 minutes under nitrogen. The substrate was then swirled with PGMEA for 1 minute and spin dried at 3000 rpm for 1 minute. PS-b-PDMS-22 was dissolved in 1,3-dioxolane to form a 0.6 wt% solution. The so...
example 3
[0121] Example 3: Chemical epitaxy of PS-b-PDMS with 32nm pitch
[0122] This example depicts the fabrication and use of a polystyrene-block-polydimethylsiloxane copolymer (PS-b-PDMS) composition prepared according to Table 1 with a domain spacing of 32 nm (PS-b-PDMS- 32).
[0123] A 1.2 wt% (solids) solution of hydroxyl-terminated poly(methyl methacrylate-random-trifluoroethyl methacrylate) in propylene glycol methyl ether acetate (PGMEA) Chemically patterned substrates were prepared by spin coating on chemical epitaxy templates (90 nm pitch, 15 nm critical dimension (CD)) with isolated polystyrene strips using Liu (Liu et al. (Macromolecules), 2011, 44(7), prepared by the method described in pages 1876-1885. The templated substrates were baked at 150°C for 1 minute and annealed at 250°C for 5 minutes under nitrogen.
[0124]The substrate was then immersed in PGMEA for 1 minute, spin dried at 3,000 rpm for 1 minute, and baked at 150° C. for 1 minute. PS-b-PDMS-32 was diss...
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