Strained thin film used for thin film pressure sensor, preparation method thereof, core body of thin film pressure sensor

Abstract

The invention discloses a strain thin film for a thin film pressure sensor, a preparation method of a strain thin film, a thin film pressure sensor core. The strain thin film is a tantalum nitride thin film. The preparation method includes the following steps that: (1) an ion beam sputtering deposition method is adopted to bombard tantalum nitride targets, a tantalum nitride thin film preparation layer can be deposited on an elastic substrate required by a thin film sensor; and (2) annealing treatment is carried out, and the strain thin film for the thin film pressure sensor can be obtained. The thin film pressure sensor core comprises a buffer layer, an insulating layer and a tantalum nitride thin film resistance layer which are sequentially arranged on the elastic substrate. The strain thin film for the thin film pressure sensor and the strain thin film prepared by the preparation method of the invention have the advantages of high strain factor, low resistance temperature coefficient and excellent electrical conductivity. The thin film pressure sensor core has the advantages of high sensitivity and high reliability in a harsh environment.

Description

technical field [0001] The invention belongs to the technical field of sensors, and in particular relates to a strained film used for a film pressure sensor and a preparation method thereof, and also relates to a core body of a film pressure sensor. Background technique [0002] Thin-film sensors are called third-generation sensors. Because thin-film pressure sensors are prepared by physical vapor deposition, they can be used in harsh environments such as high temperature, humidity, corrosion, and vibration. Due to its excellent stability and adaptability to harsh environments, thin-film pressure sensors have been widely used in the fields of aviation, aerospace, petroleum industry, and automobiles. [0003] At present, the main strain material used for the core of thin-film pressure sensors is nickel-chromium alloy, but because the strain factor of nickel-chromium alloy is lower than 2.5, the sensitivity of the sensor is limited, and because nickel-chromium alloy is exposed...

AI Technical Summary

Problems solved by technology

[0003] At present, the main strain material used for the core of thin-film pressure sensors is nickel-chromium alloy, but because the strain factor of nickel-chromium alloy is lower than 2.5, the sensitivity of the sensor is limited, and because nickel-chromium alloy is exposed to air and water vapor for a long time, the alloy The chromium in the component is easily oxidized to chromium oxide, which changes the resistance value of the strain resistance of the sensor, thus reducing the reliability of measuring strain in harsh environments, and is not suitable for measuring strain in harsh environments