Preparing method for metal/oxide compound surface enhanced Raman active substrate

A composite surface, Raman-active technology, applied in Raman scattering, metal material coating process, superimposed layer plating, etc., can solve harsh synthesis conditions, difficult to prepare multi-layer composite structures, low Raman scattering effect, etc. problem, to achieve the effect of enhanced Raman activity

Inactive Publication Date: 2016-06-08
JILIN NORMAL UNIV
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  • Summary
  • Abstract
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  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Ag and SiO 2 Combined, it is expected to prepare a high-quality SERS active substrate; but it is difficult to prepare a film with a multilayer composite structure when using the existing technology to prepare a metal / oxide composite surface-enhanced Raman active substrate, and the multilayer composite structure Compared with the single-layer composite structure, the surface-enhanced Raman scattering effect is also lower
The reasons for the difficulty in the preparation of multilayer composite structures are that the existing preparation methods are very complicated in the preparation of multilayer composite structures, and the synthesis conditions are relatively harsh. On the other hand, the applicable range of the existing preparation methods is also small. The preparation method can only be aimed at the synthesis of a composite structure

Method used

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  • Preparing method for metal/oxide compound surface enhanced Raman active substrate
  • Preparing method for metal/oxide compound surface enhanced Raman active substrate
  • Preparing method for metal/oxide compound surface enhanced Raman active substrate

Examples

Experimental program
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Effect test

Embodiment 1

[0036] 1. Prepare a two-dimensional ordered polystyrene colloidal array by self-assembly technology, and the size of the colloidal particles is 200nm.

[0037] 2. Etching is carried out for 30 seconds by plasma etching technology, and the gas used is 20% by volume of oxygen and 80% by volume of argon.

[0038] 3. By sputtering Ag and SiO 2 The composite nano-pattern structure slit array substrate was prepared from the target material, the metal film was prepared by DC sputtering, and the oxide film was prepared by AC sputtering; the substrate was rotated during co-sputtering and the background pressure of the vacuum chamber was 2.4×10 -4 Pa. Ag target and SiO 2 The sputtering power of the targets was 20 watts and 72 watts, respectively. During film deposition, the working pressure is 0.6Pa and Ag and SiO 2 The sputtering rates are 0.06 nanometers per second and 0.01 nanometers per second, and the obtained products are as Figure 1a shown.

[0039] 4. Heat treatment under ...

Embodiment 2

[0045] When the two-dimensional ordered polystyrene colloidal array is prepared by self-assembly technology, the colloidal particle size can be selected in the range of 100-500nm; the distance between the colloidal particles is 10-30nm by etching and can be used as a magnetron sputtering substrate. The conditions and parameters used in the magnetron sputtering step in embodiment 1 are conditions and parameters commonly used in the art, so this condition parameter is only as a preferred solution for implementing the present invention, except for the conditions used in embodiment 1 In addition, those skilled in the art can also achieve the same effect when ensuring that the conditions used are protective atmosphere conditions or vacuum conditions.

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Abstract

The invention provides a preparing method for a metal/oxide compound surface enhanced Raman active substrate. The method solves the problem that according to an existing technical scheme, a metal/oxide compound substrate with a multilayer film structure is hard to prepare, meanwhile, the preparing method can be suitable for compounding of a plurality of kinds of metal and oxides, and the application range is wide. According to the method, firstly, a self-assembly technology is used for preparing a two-dimensional ordered polystyrene colloidal array; then, a plasma etching technology is used for etching the two-dimensional ordered polystyrene colloidal array; thirdly, the polystyrene colloidal array subject to treatment in the second step serves as a substrate, and under the protection atmosphere or vacuum conditions, a metal/oxide compound multi-layer film sequentially grows on the surface of the substrate through a magnetron sputtering method; and finally, heat treatment is carried out under the protection atmosphere, and the surface enhanced Raman activeness of the metal/oxide compound surface enhanced Raman active substrate obtained after special heat treatment is obviously enhanced.

Description

technical field [0001] The invention belongs to the technical field of ultra-high sensitivity detection, and in particular relates to a preparation method of a surface-enhanced Raman (SERS) active substrate. Background technique [0002] The surface-enhanced Raman scattering (SERS) effect refers to that in some specially prepared heavy metal surfaces or solutions, in the excitation region, due to the enhancement of the electromagnetic field on the surface or near the surface of the sample, the Raman scattering signal intensity of the adsorbed molecules is higher than that of the ordinary Raman scattering. Significant signal enhancement. Surface-enhanced Raman scattering is a high-sensitivity detection method, and the preparation of substrates with rich hot spots, strong activity, good stability, and reusability is the key link, which is of great significance for both application and basic research. Ag is currently the most commonly used metal material for Raman signal enhan...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35C23C14/20C23C14/10C23C14/08G01N21/65
CPCC23C14/352C23C14/081C23C14/083C23C14/10C23C14/205C23C28/322C23C28/345C23C28/3455G01N21/658
Inventor 王雅新张永军陈雷刘洋杨景海赵晓宇张梦宁
Owner JILIN NORMAL UNIV
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