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A method for preparing patterned metal film based on polydopamine and product thereof

A patterned metal and polydopamine film technology, which is applied in metal material coating process, liquid chemical plating, coating, etc., can solve the problems of long cycle and high cost, and achieve strong adsorption effect

Inactive Publication Date: 2018-08-10
SOUTHWEST UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the traditional microelectronics industry, photolithography and magnetron sputtering are usually used to prepare patterned metal films. This method has high precision, but it is expensive, long-term, and requires large-scale equipment support. More importantly, this method is only applicable With a few inorganic hard substrate materials such as silicon wafers, glass, quartz, etc.; another commonly used method is based on printing technology, but this type of technology also needs to treat the surface of the substrate to ensure the printing of metal and substrate. Adhesion strength and stability. In many cases, it is necessary to perform post-treatments such as heating annealing, chemical reduction, and light on the printed substrate to improve the adhesion strength and the conductivity of the metal film.

Method used

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  • A method for preparing patterned metal film based on polydopamine and product thereof
  • A method for preparing patterned metal film based on polydopamine and product thereof
  • A method for preparing patterned metal film based on polydopamine and product thereof

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Embodiment 1

[0031] Embodiment 1, a method for preparing patterned metal thin film based on polydopamine

[0032] A method for preparing a patterned metal film based on polydopamine, comprising the steps of:

[0033] (1) Preparation of polydopamine film: immerse the clean substrate in a newly prepared dopamine solution with a pH of 8.5 and a concentration of 2 mg / mL to form a polydopamine film on the surface of the substrate, take it out, rinse it with water, and dry it with nitrogen gas to obtain The substrate of the polydopamine membrane;

[0034] (2) UV oxidation of polydopamine: a photomask is placed on the substrate of the polydopamine film attached to the gained step (1), and then the ultraviolet light intensity is 20mw / cm 2 Irradiated under the same conditions for 10 minutes, then washed with double distilled water, and dried with nitrogen to obtain the substrate of UV-oxidized polydopamine;

[0035] (3) Metal patterning: metal ions are deposited on the substrate of ultraviolet ox...

Embodiment 2

[0037] Embodiment 2, a kind of method for preparing patterned copper film based on polydopamine

[0038] Using polyester (poly(ethylene terephthalate)) as a substrate to prepare a patterned copper film, the specific steps are as follows:

[0039] (1) Preparation of polydopamine membrane: immerse clean polyester in a freshly prepared dopamine solution with a concentration of 0.1 mg / mL at pH 6 for 10 minutes, take it out and rinse it with water, and place it in a dopamine solution with a concentration of 0.1 mg / mL at pH 6. Repeated immersion in the water for 20 times, took out and rinsed with water, and then dried with nitrogen to obtain a substrate with a polydopamine film;

[0040] (2) Ultraviolet oxidation of polydopamine: a photomask is placed on the substrate of the polydopamine film attached to the gained step (1), and then the ultraviolet light intensity is 10mw / cm 2 Irradiated under the same conditions for 15 minutes, then washed with double distilled water, and dried w...

Embodiment 3

[0070] A method for preparing a patterned silver film based on polydopamine, comprising the steps of:

[0071] (1) Preparation of polydopamine membrane: immerse the clean glass slide in a newly prepared solution with a pH of 8.5 and a dopamine concentration of 2 mg / mL for 7 hours, take it out, rinse it with double distilled water, and dry it with nitrogen to obtain the attached film. Substrate with polydopamine membrane;

[0072] (2) UV oxidation of polydopamine: a photomask is placed on the substrate with polydopamine film, and the ultraviolet light intensity is 35mw / cm 2 Irradiated for 15 minutes under the same conditions, then washed with double distilled water, and dried with nitrogen;

[0073] (3) Metal patterning: Add ammonia water dropwise to the 10mM silver nitrate solution, the solution turns light brown, continue to add ammonia water until the solution becomes colorless, then add an equal volume of 3.33mM glucose solution to the system to oxidize the UV Insert the ...

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Abstract

The invention discloses a method for manufacturing a patterned metal film based on poly-dopamine and a product thereof. The manufacture method comprises the steps that first, a clean substrate is dipped in a dopamine solution with the pH value of 6-9 and the concentration of 0.1-10 mg / ml till a poly-dopamine film is formed on the surface of the substrate; the substrate is taken out, is washed with water and then is blow-dried with nitrogen, so that the substrate adhered with the poly-dopamine film is obtained; then a photomask is placed on the substrate adhered with the poly-dopamine, and then the substrate is radiated for 3-15 minutes in the ultraviolet light with the intensity of 10-35 mw / cm<2>, is cleaned with double distilled water, and is blow-dried with nitrogen, so that a substrate with an ultraviolet oxidized poly-dopamine is obtained; and finally metal ions are deposited on the substrate with the ultraviolet oxidized poly-dopamine. The method disclosed by the invention is applicable to any solid materials which can be both planar substrates and curved or porous surface substrates, and different pattered metal films can be manufactured; and the manufactured patterned metal films can be applied to microcircuits, microarrays and bioinstrumentation.

Description

technical field [0001] The invention belongs to the field of electrical components, and in particular relates to a polydopamine-based method for preparing a patterned metal thin film, and also relates to a patterned metal thin film prepared by the method. Background technique [0002] Patterned metal thin films play an important role as electrodes, contacts or connecting lines in various new portable electronic devices. In the traditional microelectronics industry, photolithography and magnetron sputtering are usually used to prepare patterned metal films. This method has high precision, but the cost is high, the cycle is long, and large-scale equipment is required. More importantly, this method is only applicable With a few inorganic hard substrate materials such as silicon wafers, glass, quartz, etc.; another commonly used method is based on printing technology, but this type of technology also needs to treat the surface of the substrate to ensure the printing of metal and...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C18/18C23C18/40C23C18/44
CPCC23C18/1608C23C18/1612C23C18/40C23C18/44
Inventor 胡卫华赵雷
Owner SOUTHWEST UNIV
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