Cyanide-free copper electro-plating solution, preparation method and using method thereof
A technology for electroplating copper and solution, applied in the field of material science, can solve the problems of poor adhesion between the coating and the substrate, narrow current density range, low current efficiency, etc., achieve potential application prospects and economic benefits, and improve current density range and cost. low cost effect
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Embodiment 1
[0018] Embodiment 1 of the present invention: a non-cyanide copper electroplating solution, wherein the concentration of copper sulfate is 45g / L, the concentration of succinimide is 100g / L, the concentration of potassium nitrate is 25g / L, and the concentration of citric acid is 20g / L, the concentration of triethanolamine is 30g / L, the concentration of potassium hydroxide is 40g / L, and the solvent is water.
Embodiment 2
[0019] Embodiment 2 of the present invention: a method for preparing a non-cyanide copper electroplating solution, including the following steps: selecting each component and the amount of solvent according to the above concentration;
[0020] 1) Dissolve potassium nitrate in the succinimide solution to obtain solution A
[0021] 2) Add citric acid and triethanolamine to solution A separately to obtain solution B;
[0022] 3) Add potassium hydroxide solution to adjust the pH of solution B to 9-10 to obtain solution C;
[0023] 4) Dissolve copper sulfate in distilled water, then slowly add the acid copper solution to solution C, and keep stirring to obtain solution D;
[0024] 5) Add potassium hydroxide solution again, adjust the pH of solution D to 9-10, and fix the volume to obtain the finished product.
Embodiment 3
[0025] Embodiment 3 of the present invention: The method of using the cyanide-free copper electroplating solution. The cyanide-free copper electroplating solution is used for cyanide-free copper plating on the surface of carbon steel. The process steps are as follows:
[0026] Mechanical polishing → deionized water washing → degreasing → deionized water washing → activation → deionized water washing → copper electroplating → deionized water washing → passivation (anti-tarnish treatment) → deionized water washing → drying
[0027] In the electroplating process, the electroplating temperature is 30~40℃, and the current density is 0.2~8A / dm 2 , The time is 20-40min, and the molar ratio of copper ion to succinimide is 1:6.
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