Microstructure silicon-based material, preparation method thereof and semiconductor device
A technology of silicon-based materials and manufacturing methods, applied in semiconductor devices, microstructure technology, electric solid-state devices, etc., can solve the problems of cumbersome processing steps and high processing costs of imaging sensors, and achieve low cost, simple manufacturing methods, and simple processes Effect
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[0053] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
[0054] The invention provides a method for making a microstructured silicon-based material, such as figure 1 shown, including:
[0055] Step S101: providing silicon wafer and microsphere solution.
[0056] It should be noted that the doping type of the silicon wafer is not limited in the present invention, nor is the crystal orientation of the silicon wafer. Preferably, the silicon wafer in this embodiment is n-type and crystallographic to 100 wafers. Those...
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