Preparation method of quartz glass and quartz glass

A quartz glass and silica technology, applied in glass manufacturing equipment, glass molding, manufacturing tools, etc., can solve the problems of inability to meet high-end market demands, inability to actively and precisely control hydroxyl groups, and uncontrollable hydroxyl content.

Pending Publication Date: 2016-11-16
CHINA BUILDING MATERIALS ACAD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] In the existing quartz glass preparation process, the content of hydroxyl groups is uncontrollable, and the active and precise regulation of hydroxyl groups cannot be carried out, which cannot meet the needs of high-end markets such as aerospace, semiconductor lithography, and strong lasers.

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  • Preparation method of quartz glass and quartz glass
  • Preparation method of quartz glass and quartz glass
  • Preparation method of quartz glass and quartz glass

Examples

Experimental program
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Effect test

Embodiment 1

[0050] Such as figure 1 As shown, one embodiment of the present invention proposes a method for preparing quartz glass, which is used to prepare a silica soot body into a finished quartz glass product in a sintering space, wherein the silica soot body has pores; The sintering device for preparing quartz glass described in the following embodiment 2 is implemented, and for details, refer to the relevant expressions in the following embodiment 2. The methods include:

[0051] S10, introducing a water vapor atmosphere into the sintering space, sintering the silicon dioxide loose body in an environment containing water vapor, and sintering the silicon dioxide loose body into transparent quartz glass;

[0052] The inventors have obtained a technical solution for how to increase hydroxyl groups in the porous silica body through experiments: water vapor reacts and / or adsorbs in the porous silica body, forming a large number of hydroxyl groups and / or physical absorb water,

[0053]...

Embodiment 2

[0113] Embodiment 2 of the present invention provides a sintering device for preparing quartz glass, which is used for sintering a soot silica body to obtain a finished quartz glass product, wherein the soot silica body has pores; the soot silica body has a diameter of Can be more than 300mm; such as φ350mm, φ550mm, φ750mm, φ850mm, φ950mm.

[0114] The silicon dioxide loose body can be synthesized from silicon-containing raw materials through low-temperature chemical vapor deposition. The silicon dioxide loose body is a high-purity silicon dioxide loose body, and the silicon dioxide in the high-purity silicon dioxide loose body is The content is above 99.99%. Or the silica soot body is a doped silica soot body, and the doping elements are boron (B), aluminum (Al), fluorine (F), iron (Fe), titanium (Ti), cerium (Ce), At least one of calcium (Ca), magnesium (Mg), sodium (Na), potassium (K), barium (Ba), yttrium (Y), lanthanum (La), zirconium (Zr), and germanium (Ge).

[0115] ...

Embodiment 3

[0145] Such as Figure 5 As shown, a system for preparing quartz glass provided by Embodiment 3 of the present invention includes:

[0146] A low-temperature chemical vapor deposition device (not shown in the figure) is used for synthesizing silicon-containing raw materials through low-temperature chemical vapor deposition to obtain a silicon dioxide loose body, and the silicon dioxide loose body is a high-purity silicon dioxide loose body or a doped silicon dioxide Heterosilica soot body, wherein the content of silicon dioxide in the high-purity silica soot body is above 99.99%;

[0147] A sintering device 100 for preparing quartz glass, the sintering device for preparing quartz glass includes:

[0148] a furnace body, the furnace body has a sintering space for accommodating the silica loose body;

[0149] The furnace body also has a heater for heating the sintering space;

[0150] The furnace body is also equipped with a vacuum passage connecting the sintering space, whic...

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Abstract

The invention relates to a preparation method of quartz glass and quartz glass, belongs to the field of quartz glass preparation, and mainly aims to realize preparation of quartz glass with controllable hydroxyl content. The preparation method comprises the following steps: injecting steam atmosphere into a sintering space, enabling reaction and / or adsorption of steam in a silicon dioxide loose body in a steam-containing environment to form lots of hydroxyls and / or physically absorbed water in the silicon dioxide loose body, and sintering the silicon dioxide loose body with high hydroxyl content into transparent quartz glass; cooling the transparent quartz glass prepared after sintering to obtain quartz glass end product. The hydroxyl content in the silicon dioxide is effectively controlled by controlling the steam injection flow rate, air pores in the silicon dioxide loose body are removed through sintering the silicon dioxide loose body to prepare the high-quality synthetic quartz glass with controllable hydroxyl content, and the problem that conventional preparation technologies cannot meet the application requirements for different hydroxyl content ranges from quartz glass is solved.

Description

technical field [0001] The invention relates to the field of quartz glass preparation, in particular to a method for preparing quartz glass and the quartz glass. Background technique [0002] Hydroxyl (OH) in quartz - ) content has a great influence on the quality of quartz glass. For example, it can strongly absorb infrared light waves of a certain wavelength. With the change of hydroxyl content in quartz glass, the performance of quartz glass also changes; In some occasions, it is beneficial to its performance. For example, in the aerospace field, due to strong cosmic ray radiation, quartz glass is required to be resistant to cosmic ray radiation, and the required hydroxyl content is high. Therefore, different fields require different hydroxyl content in quartz glass, and it is necessary to realize controllable hydroxyl content in quartz glass in order to meet the application requirements of quartz glass in different application fields. [0003] At present, the preparati...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03B20/00
CPCC03B19/066C03B2201/04C03B2201/075
Inventor 聂兰舰向在奎饶传东王蕾刘飞翔邵竹锋王慧王宏杰贾亚男符博张辰阳王玉芬
Owner CHINA BUILDING MATERIALS ACAD
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