High-hardness CrAlN coating layer containing multiphase AlCrN nanometer insertion layer and preparation method thereof
A high-hardness, intercalated layer technology, applied in the field of materials science, can solve the problems of hardness, oxidation resistance, deposition conditions and deposition efficiency, and achieve the effect of improving hardness and life
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[0031] Preparation, characterization and measuring instruments used in the present invention:
[0032] JGP-450 Magnetron Sputtering System, Shenyang Scientific Instrument Development Center Co., Ltd., Chinese Academy of Sciences
[0033] D8 Advance X-ray diffractometer, Bruker, Germany
[0034] NANO Indenter G200 nanoindenter, Agilent Technologies, USA
[0035] Tecnai G 2 Model 20 high-resolution transmission electron microscope, FEI, USA
[0036] Quanta FEG450 scanning electron microscope, American FEI company
Embodiment 1
[0038] Using Cr 50 al 50 (50 atom%:50 atom%) composite target and Al 80 Cr 20 (80 atom%:20 atom%) composite target with a diameter of 75mm;
[0039] Ar gas flow: 38sccm, N 2 Air flow: 5sccm; target base distance 3-7cm, total air pressure range 0.6Pa.
[0040] Cr 50 al 50 N-layer sputtering power DC 120W, time 12s; heterogeneous Al 80 Cr 20 N-layer sputtering power radio frequency 80W, time 2s;
[0041] After testing, the obtained Cr 50 al 50 N layer thickness is 4.0nm, heterogeneous Al 80 Cr 20 The thickness of the N layer is 0.3 nm, the total thickness is 1.8 μm, and the hardness is 35.4 GPa.
Embodiment 2
[0043] Using Cr 50 al 50 (50 atom%:50 atom%) composite target and Al 80 Cr 20(80 atom%:20 atom%) composite target with a diameter of 75mm;
[0044] Ar gas flow is 38sccm, N 2 The air flow rate is 5sccm; the target base distance is 3-7cm, and the total air pressure is 0.6Pa;
[0045] Cr 50 Al 50 N-layer sputtering power DC 120W, time 15s; heterogeneous Al 80 Cr 20 N layer sputtering power radio frequency 80W, time 3s.
[0046] After testing, the obtained Cr 50 Al 50 N layer thickness is 5.0nm, heterogeneous Al 80 Cr 20 The thickness of the N layer is 0.4 nm, the total thickness is 2.1 μm, and the hardness is 36.1 GPa.
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