Skin care base with moisturizing and soothing effects on sensitive skin and preparation and application thereof
A technology for sensitive skin, applied in the direction of medical preparations containing active ingredients, preparations for skin care, preparations for grooming, etc., to achieve the effect of simple production process, convenient use, long-term moisturizing and soothing sensitive skin
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0037] 1. A preparation method of a skin care base with moisturizing and soothing effects on sensitive skin, the specific steps are:
[0038] (1) deionized water with a mass fraction of 50% was heated to 85°C, kept for 15 minutes, and then cooled to 38°C;
[0039] (2) The mass fraction of 10% Alpinia officinalis extract, 20% mass fraction of carbohydrate isomers, 10% mass fraction of β-glucan, and 5% mass fraction of inositol glycerophosphate Choline salt and Artemia (ARTEMIA) extract with a mass fraction of 5% are added to the water in step (1), stirred for 10 min, the stirring speed is 1200 rpm, and filtered with a 200-mesh filter cloth to obtain a moisturizing and soothing sensitive skin effect. Skin care base.
[0040] 2. A toner containing a skin care base, which is composed of the following components by mass percentage:
[0041] Component A: 8.0% glycerol, 5% butylene glycol, 0.4% phenoxyethanol, 0.2% carbomer, 66.2% deionized water;
[0042] Component B: 20% of the ...
Embodiment 2
[0049] 1. A preparation method of a substrate with moisturizing and soothing effects on sensitive skin, the specific steps are:
[0050] (1) deionized water with a mass fraction of 32.5% was heated to 85°C, kept for 15 minutes, and then cooled to 38°C;
[0051] (2) The mass fraction of 12.5% alpine velvet grass extract, 25% mass fraction of sugar isomers, 15% mass fraction of β-glucan, and 7.5% mass fraction of glycerophosphate Inositol choline salt and 7.5% Artemia (ARTEMIA) extract are added to the water in step (1), stirred for 10 minutes, the stirring speed is 1200 rpm, and the material is filtered with a 200-mesh filter cloth to obtain moisturizing and soothing sensitive skin. Effective skin care base.
[0052] 2. A toner containing a skin care base, which is composed of the following components by mass percentage:
[0053] Component A: 8.0% glycerol, 5% butylene glycol, 0.4% phenoxyethanol, 0.2% carbomer, 66.2% deionized water;
[0054] Component B: 20% of the above...
Embodiment 3
[0061] 1. A preparation method of a substrate with moisturizing and soothing effects on sensitive skin, the specific steps are:
[0062] (1) deionized water with a mass fraction of 15% was heated to 85°C, kept for 15 minutes, and then cooled to 38°C;
[0063] (2) 15% Edelweiss alpine extract, 30% saccharide isomers, 20% β-glucan, 10% glycerophosphoric acid The alcohol choline salt and the 10% Artemia (ARTEMIA) extract are added to the water in step (1), stirred for 10 minutes, the stirring speed is 1200 rpm, and the material is filtered with a 200-mesh filter cloth to obtain the effect of moisturizing and soothing sensitive skin. skin care base.
[0064] 2. A toner containing a skin care base, which is composed of the following components by mass percentage:
[0065] Component A: 8.0% glycerol, 5% butylene glycol, 0.4% phenoxyethanol, 0.2% carbomer, 66.2% deionized water;
[0066] Component B: 20% of the above skin care base;
[0067] Component C: Triethanolamine 0.2%.
...
PUM
Property | Measurement | Unit |
---|---|---|
refractive index | aaaaa | aaaaa |
refractive index | aaaaa | aaaaa |
refractive index | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com