Preparation method of composite transparent electrode with metal membrane wrapped by in-situ growth graphene
A graphene-coated, transparent electrode technology, applied in the direction of cable/conductor manufacturing, circuits, electrical components, etc., can solve the problems affecting the quality of graphene, the corresponding high cost, high substrate requirements, etc., to overcome instability Defects, overcoming wrinkles, and improving light transmittance
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[0040] Example one
[0041] Such as figure 1 As shown, the method for preparing a composite transparent electrode using in-situ growth of graphene-coated metal film according to the first embodiment of the present invention includes:
[0042] Step S1. Making a cracking template: by depositing a layer of organosol film 2 that is easy to remove on the top surface of the glass substrate 1, and controlling the natural cracking of the organosol film 2 to form a tortoise on the top surface of the glass substrate 1. Split template 3 (see figure 2 ), and the irregular network cracks 3a of the crack template 3 penetrate deeply into the top surface of the glass substrate 1.
[0043] The specific operation steps of the above step S1 are:
[0044] In step S1-1, the nail polish of the model CA600 and the ethanol solvent are mixed uniformly in a ratio of 1:2, as the cracking liquid. The specific steps are as follows. Take 10ml of the nail polish stock solution of model CA600 in a beaker, and then...
Example Embodiment
[0060] Example two
[0061] The second embodiment of the present invention is basically the same as the first embodiment, and the difference is: in the second embodiment, the specific operation steps of step S2 are: using high-purity copper as the raw material, using a vacuum coating equipment to adopt a thermal evaporation method in the step A copper metal layer with a thickness lower than that of the cracking template 3 is deposited on the top surface of the glass substrate 1 made of S1 to form a mesh metal film 4, wherein the vapor deposition current when the vacuum coating equipment performs thermal vapor deposition is 100A, The evaporation voltage is 0.5V, the evaporation time is 20min, and the vacuum degree is 3*10 -4 Torr.
[0062] After testing, the composite transparent electrode made in the second embodiment adopts the thermal vapor deposition to deposit the metal film. Under vacuum conditions, the evaporator is used to heat the vaporized metal to vaporize it, and the vap...
Example Embodiment
[0063] Example three
[0064] The third embodiment of the present invention is basically the same as the first embodiment. The differences are: in step S2 of the third embodiment, the vacuum coating equipment performs magnetron sputtering with a power of 150W and a temperature in the magnetron chamber at 25°C. The deposition rate of the copper metal layer is 12 nm / min, and the thickness of the mesh metal film 4 obtained in this step is between 200 nm and 400 nm.
[0065] After experiments, the composite transparent electrode made in this example three, because the deposition rate of magnetron sputtering is proportional to the power, due to the reduction of the power of magnetron sputtering, the rate of metal deposition decreases, so that the rate of metal deposition is reduced under the same time conditions. , The thickness of the obtained metal network structure is too small, which reduces the overall performance of the composite transparent electrode.
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