Preparation method for inhibiting light attenuation of solar cells
A solar cell and light attenuation technology, applied in the field of solar cells, can solve the problems of solar cell photoelectric conversion efficiency decline, light-induced attenuation, uneven concentration of doping elements, etc., to improve photoelectric conversion efficiency, reduce recombination strength, and wide application foreground effect
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Embodiment 1
[0018] A preparation method for suppressing light attenuation of solar cells, comprising the following steps:
[0019] (1) Mix the polysilicon raw material with boron and mix evenly, put it into a single crystal furnace and heat up to 1420°C, grow under dark light treatment after melting to obtain boron-doped Czochralski single crystal silicon, slice and clean to obtain silicon wafer A ;
[0020] (2) Put the silicon wafer A obtained in step (1) into a reducing atmosphere for annealing treatment, wherein the annealing temperature is 720°C, the holding time is 4 hours, and the reducing atmosphere is composed of carbon monoxide, nitrogen and methane by volume The ratio is 2:1:2 composition;
[0021] (3) The silicon wafer A obtained after annealing in the step (2) is carried out the preparation of solar cell, comprises: silicon wafer A is cleaned and textured, and phosphorus diffusion, etching and deposition of anti-reflection film are carried out after texture , and finally pre...
Embodiment 2
[0023] A preparation method for suppressing light attenuation of solar cells, comprising the following steps:
[0024] (1) Mix the polysilicon raw material with boron and mix evenly, put it into a single crystal furnace and heat up to 1380°C, grow under dark light treatment after melting to obtain boron-doped Czochralski single crystal silicon, slice and clean to obtain silicon wafer A ;
[0025] (2) Put the silicon wafer A obtained in step (1) into a reducing atmosphere for annealing treatment, wherein the annealing temperature is 600° C., the holding time is 8 hours, and the reducing atmosphere is composed of carbon monoxide, nitrogen and methane by volume The ratio is 2:1:2 composition;
[0026] (3) The silicon wafer A obtained after annealing in the step (2) is carried out the preparation of solar cell, comprises: silicon wafer A is cleaned and textured, and phosphorus diffusion, etching and deposition of anti-reflection film are carried out after texture , and finally p...
Embodiment 3
[0028] A preparation method for suppressing light attenuation of solar cells, comprising the following steps:
[0029] (1) Mix the polysilicon raw material with boron and mix it evenly, put it into a single crystal furnace and heat it up to 1460°C, grow it under dark light treatment after melting to obtain boron-doped Czochralski single crystal silicon, slice and wash to obtain silicon wafer A ;
[0030] (2) Put the silicon wafer A obtained in step (1) into a reducing atmosphere for annealing treatment, wherein the annealing temperature is 800° C., the holding time is 1 hour, and the reducing atmosphere is composed of carbon monoxide, nitrogen and methane by volume The ratio is 2:1:2 composition;
[0031] (3) The silicon wafer A obtained after annealing in the step (2) is carried out the preparation of solar cell, comprises: silicon wafer A is cleaned and textured, and phosphorus diffusion, etching and deposition of anti-reflection film are carried out after texture , and fi...
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