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Preparation method of silicon carbide base polishing synthetic paper

A silicon carbide-based, synthetic paper technology, applied in polishing compositions containing abrasives, etc., can solve the problems of corrosive metal equipment, easy volatility, poor quality stability, etc., and achieves easy control of the production process, simple production process, and use. Ease of the process

Inactive Publication Date: 2017-03-08
HUNAN UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

For example, acidic polishing liquid is highly corrosive to metals and is easy to corrode metal equipment; alkaline polishing liquid has high impurity content, poor quality stability, is volatile, pollutes the environment, endangers human health, etc.; polishing powder has poor suspension and low grinding efficiency , the surface is easily scratched, etc.
In addition, polishing liquid and polishing powder are not easy to handle in practical applications

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0024] Weigh 24 kg of polyether polyurethane particles with a Shore hardness of 85A and 110 kg of N-N-dimethylformamide into the reactor, heat to 50°C and stir to completely dissolve the polyether polyurethane particles to obtain a polyurethane solution ; Add 24 kg of 400 mesh black silicon carbide powder, stir with a high-speed stirrer to obtain a solid-liquid mixture; after standing for 6 hours to defoam, coat the solid-liquid mixture on the release paper with a certain thickness, and then apply the release paper The liner is immersed in a 3% water-based polypropylene wax emulsion (temperature is 25°C); after the solid-liquid mixture is completely cured to form a film, put the liner and film together in a drying oven and dry at 50°C 2 h; by adjusting the thickness of the solid-liquid mixture coated on the release paper to control the total thickness of the film to 0.11mm; remove the release paper after the release paper and the film are cooled, and finally cut the film into a...

Embodiment 2

[0027] Weigh 16 kg of polyether polyurethane particles with a Shore hardness of 90A, 16 kg of polyester polyurethane particles with a Shore hardness of 90A, and 110 kg of N-N-dimethylacetamide into the reactor, and heat to 70 ℃ and stirred to completely dissolve the thermoplastic polyurethane particles to obtain a polyurethane solution; then add 45 kg of 600-mesh green silicon carbide powder and stir with a high-speed stirrer to obtain a solid-liquid mixture; after standing for 7 hours to defoam, the solid-liquid mixture Coat the release paper with a certain thickness, and then immerse the release paper in a water-based polypropylene wax emulsion with a mass percentage of 5% (temperature is 20°C); after the solid-liquid mixture is completely cured to form a film, the release paper The type paper and the film were placed in a drying oven and dried at 52°C for 1.5 h. The total thickness of the film is controlled to 0.15mm by adjusting the thickness of the solid-liquid mixture co...

Embodiment 3

[0030] Weigh 18 kg of polyether polyurethane particles with a Shore hardness of 92A, 7 kg of polyester polyurethane particles with a Shore hardness of 92A, and 110 kg of N-N-dimethylformamide into the reactor, and heat to 60 ℃ and stirred to completely dissolve the thermoplastic polyurethane particles to obtain a polyurethane solution; then add 42 kg of 800 mesh black silicon carbide powder, stir with a high-speed stirrer to obtain a solid-liquid mixture; after standing for 5 hours to defoam, the solid-liquid mixture Coat the release paper with a certain thickness, and then immerse the release paper in a water-based polypropylene wax emulsion with a mass percentage of 5% (temperature is 30°C); after the solid-liquid mixture is completely cured to form a film, the release paper The type paper and the film were put into a drying oven together and dried at 56°C for 1.5 h. The total thickness of the film is controlled to be 0.18mm by adjusting the thickness of the solid-liquid mix...

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Abstract

The invention discloses a preparation method of silicon carbide base polishing synthetic paper. The material of the paper mainly comprises silicon carbide and polyurethane. The preparation method comprises the steps of mixing silicon carbide powder and prepared polyurethane solution in certain condition, through subsequent curing treatment and filming, acquiring the silicon carbide base synthetic paper. The paper has the advantages of being simple for production process control, and being convenient to use. Compared with polishing solution and polishing powder, the paper can be directly used for polishing article surface. The operation process generates no secondary pollution to the polished article surface. After the polishing, no cleaning operation is necessary. The paper can exert a double-polishing function to the article with better polishing quality. The silicon carbide particles in the paper can exert a mechanical polishing function to the article surface, and remove the pinholes, burrs and the like on the article surface effectively. The polypropylene wax component in the polishing synthetic paper can exert a glazing function to the article in the polishing process.

Description

technical field [0001] The invention belongs to the technical field of organic-inorganic composite material production, and specifically relates to a preparation method of silicon carbide-based polished synthetic paper. Background technique [0002] Polishing technology refers to the process of processing the surface of the workpiece by using the high-speed rotation of various grinding heads of the polishing machine. The polishing process includes: scraping grinding, rough grinding, medium grinding, fine grinding, polishing, edging and chamfering. At present, polishing technology has been widely used in cold processing of glass surface, processing of flat glass, cathode ray tube, TV computer monitor, glass shell, spectacle lens, optical glass, lens, gemstone, crystal, decoration and other devices. The application prospect Very broad. [0003] The materials used for polishing in the current market are mainly polishing liquid and polishing powder. Although they have the adv...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08L75/08C08L75/06C08L23/12C08K3/34C09G1/02
CPCC08L75/08C08L75/06C08L2205/03C09G1/02C08L23/12C08K3/34
Inventor 周虎王东东漆志凌欧宝立李友凤刘国清陈雷
Owner HUNAN UNIV OF SCI & TECH