Preparation method for deuterium-containing metal film target

Abstract

The invention discloses a preparation method for a deuterium-containing metal film target. The preparation method comprises the following steps: firstly, using high-purity molybdenum or high-purity copper as a substrate material of the deuterium-containing metal film target, and performing surface pretreatment on the substrate material; secondly, mounting and placing the substrate into a physical vapor deposition (PVD) vacuum coating machine, bombarding the surface of the substrate with argon ions, removing an oxide layer on the surface of the substrate by sputtering; thirdly, setting the coating temperature of the substrate, introducing high-purity deuterium gas in a vacuum cavity, starting the coating machine, and directly preparing the deuterium-containing metal film; fourthly, turning off the coating machine, continually introducing deuterium gas into the vacuum cavity, and turning off a deuterium gas flower meter until an appropriate air pressure is reached in the cavity. By adopting the preparation method, the mechanical performance of the deuterium-containing metal film target is improved, the brittleness and occurrence of cracks are controlled effectively, and adhesive force of the target film is enhanced; meanwhile, the thickness of a dead layer on the surface is decreased, the purity of the target film is increased, the neutron yield of a neutron generator is increased, and the service life of the target is prolonged.

Description

technical field [0001] The invention relates to the field of metal hydrogen storage materials and the field of neutron generator target preparation, in particular to a method for preparing a deuterium-containing metal film target. Background technique [0002] Based on the mechanism of high-energy deuterium ions bombarding deuterium nuclei to generate neutrons, the deuterium-containing metal film target with high deuterium density is a key component of the neutron generator. During the operation of the neutron generator, the deuterium-containing metal film target is bombarded by the deuterium ion flow, and the local temperature of the surface will increase accordingly, which puts forward higher requirements for the thermal stability of the deuterium-containing metal film target. In addition, an oxide layer, commonly known as "dead layer", will inevitably form on the surface of the deuterium-containing metal thin film target. As the storage time increases, the oxide layer wil...

AI Technical Summary

Problems solved by technology

This method has the following defects: 1. After the hydrogen storage metal film absorbs deuterium, there will be unique hydrogen embrittlement and volume expansion, which will deteriorate the mechanical properties of the film, reduce the bonding force between the film and the substrate, and cause the target film to drop powder. This phenomenon is more likely to occur after deuterium ion bombardment

2. The hydrogen storage metal film is easily polluted by carbon, oxygen and other elements, forming carbides or oxides with a thickness of dozens or even tens of nanometers on the surface, which reduces the performance of deuterium absorption at high temperature on the one hand, and will cause a decrease in neutron yield

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