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41 results about "Deuterium ions" patented technology

Spiral rf-induction antenna based ion source for neutron generators

An ion source for the generation of hydrogen or deuterium ions is disclosed, said source suitable for the generation of D-D and D-T neutrons, wherein the body of the ion source is cylindrical, and disposed at one end of the ion source opposite the extraction plate, is a single, spiraled RF coil antenna, in which the spiraled coils are flat.
Owner:RGT UNIV OF CALIFORNIA

Method for manufacturing a magneto-resistance effect element and magnetic recording and reproducing apparatus

A method for manufacturing a magneto-resistance effect element is provided. The magneto-resistance effect element includes a first magnetic layer including a ferromagnetic material, a second magnetic layer including a ferromagnetic material and a spacer layer provided between the first magnetic layer and the second magnetic layer, the spacer layer having an insulating layer and a conductive portion penetrating through the insulating layer. The method includes: forming a film to be a base material of the spacer layer; performing a first treatment using a gas including at least one of oxygen molecules, oxygen atoms, oxygen ions, oxygen plasma and oxygen radicals on the film; and performing a second treatment using a gas including at least one of hydrogen molecules, hydrogen atoms, hydrogen ions, hydrogen plasma, hydrogen radicals, deuterium molecules, deuterium atoms, deuterium ions, deuterium plasma and deuterium radicals on the film submitted to the first treatment.
Owner:KK TOSHIBA +1

Pulsed neutron generator

The present invention provides a pulsed neutron generator. In a high vacuum and high pressure ceramic tube, when a trigger pulse is added between the source trigger pole and cathode of vacuum arc ion, the deuterium atom is ionized and the initial plasma is diffused, such that the anode and the cathode of the ion source is conducted, the arc current is formed, and the high density plasma is generated. Under the action of accelerating the high pressure, the deuterium ion beam interacts with the tritium titanium target, the deuterium tritium reaction produces, and the pulsed neutron with the energy of 14 MeV is generated. A circular magnetic field is set up at the lead pole of the vacuum arc ion source, which can focus on the formation of the deuterium ion, increase the deuterium ion beam to the target, improve the pulsed neutron yield; The combination of a dry pump, a molecular pump, an ion pump and an air pump is used to improve the vacuum degree of the system, and reduce the loss of deuterium ion beam in the transmission process. The aluminum film with the thickness of 400 nm is coated on the surface of the tritium titanium target, which prevents the heavy ion from reaching the tritium target, and reduces the damage of the target.
Owner:INST OF NUCLEAR PHYSICS & CHEM CHINA ACADEMY OF

Small high-yield deuterium-deuterium neutron generator

The invention discloses a small high-yield and deuterium-deuterium neutron generator. Modular distributed high-frequency ion sources are adopted and evenly distributed on the outer surface of a ceramic cylinder with the spherical end, and deuterium ion beams distributed evenly are output, wherein the flow intensity of the deuterium ion beams is larger than 1 A, and the single atom proportion is larger than 80%; the deuterium ion beams are accelerated in a cylindrical accelerating electric field with the spherical end and bombard a cylindrical metal or ceramic self-forming target to cause a deuterium / deuterium reaction and then generate neutrons of 2.45 MeV, and the self-forming target is located at the high-potential end and provided with the spherical end. The number of the modular distributed high-frequency ion sources and the area of the self-forming target are not limited, the yield of the neutrons of the deuterium / deuterium reaction is larger than 1011 n / s, and no radioactive pollutants are discharged. The neutron generator is suitable for commercialized application such as the fields of boron neutron capture treatment, neutron radiography, on-line material component neutron detection, neutron irradiation modification and californium neutron source substitute products.
Owner:INST OF NUCLEAR PHYSICS & CHEM CHINA ACADEMY OF

Small directional high-flux neutron generator

InactiveCN103813611AUnlimited deposition powerHigh outputDirect voltage acceleratorsNeutron yieldDeuterium ions
The invention discloses a small neutron generator which outputs high-flux neutrons in a specific direction. A rectangular penning ion source educes deuterium ions or deuterium tritium mixed ions with a certain width, and the ions bombard a long directional target under the coaxial electric field acceleration so as to generate high-flux neutrons in the axis direction of the target. Because the rectangular penning ion source and the long direction target can be prolonged randomly according to the requirements, the intensity of the ion beam output from the ion source, the power bore by the long directional target and the corresponding neutron yield are greatly improved. The axial projected area of the long directional target is small, so that the neutron flux level is 1 to 2 higher than that of the normal neutron generator in the axial direction; the small directional high-flux neutron generator is applicable to the fields which have direction requirements, such as neutron therapy, picture taking and explosive detection.
Owner:INST OF NUCLEAR PHYSICS & CHEM CHINA ACADEMY OF

Preparation method of tritium or deuterium-labeled cyadox

The invention relates to a preparation method of a feed drug additive cyadox by tritium or deuterium labeling. The preparation method comprises the following steps: dehalogenating 4-bro-2-nitroaniline or 4-iodo-2-nitroaniline to exchange with tritium or deuterium in tritium gas or deuterium gas in the presence of a catalyst and an acid receptor to produce 4-[3]H-2-nitroaniline or 4-[2]H-2-nitroaniline; and preparing the tritium or deuterium-labeled cyadox by microsynthesis after an oxidation reaction, a Beirut reaction and a hydrazone forming reaction so as to obtain the tritium-labeled cyadox with high specific activity (12.63Ci / mmol), high radiochemical purity (above 98%) and high chemical purity (above 99.5%) or the deuterium-labeled cyadox with high chemical purity (above 99.5%). The method provides a material basis for systematic development of rules of absorption, distribution and metabolism of the cyadox in animals. The prepared 4-[3]H-2-nitroaniline or 4-[2]H-2-nitroaniline can be taken as a starting material for synthesizing all tritium or deuterium-labeled quinoxaline drugs without other substituents at the sixth place of a quinoxaline ring and is an important substance for synthesizing the tritium or deuterium-labeled drugs.
Owner:HUAZHONG AGRI UNIV

Scalable high efficiency nuclear fusion energy source

This invention combines minor, but not obvious, adaptations of available and, for this field, relatively simple hardware that primarily uses the least power-hungry electrostatic (rather than mainly magnetic) control of accelerated colliding beams of bare deuterium nuclei in three-dimensionally pre-determined collision attitudes that are now found by new research to offer a method (with required apparatus) of fusing directly to helium four with high efficiency release of the greatest possible single-step free energy of fusion in kinetic energy of helium four charged nuclei and with minimized side-effects (if any) of wasted energy and troublesome output products in neutrons, radiation, helium three or tritium nuclei, and plasma electrons. This invention can be combined with the most efficient prior art in deuterium ion sources, continued fusion processes, output power conversion, and full reactor assembly at any scale from laboratory experiments to industrial power networks.
Owner:MR & MRS FRED E HOWARD JR FAMILY LIVING REVOCABLE TRUST

Method for designing semiconductor device

A semiconductor device may be designed in the following manner. A stacked layer of a silicon oxide film and an organic film is provided over a substrate, deuterated water is contained in the organic film, and then a conductive film is formed in contact with the organic film. Next, an inert conductive material that does not easily generate a deuterium ion or a deuterium molecule is selected by measuring the amount of deuterium that exists in the silicon oxide film.
Owner:SEMICON ENERGY LAB CO LTD

Neutron source

The invention provides a neutron source. A porous ion source is adopted for the neutron source, so as to educe deuterium ions or deuterium and tritium mixed ions with specific shapes and density distribution. Each educing hole is provided with corresponding initial focusing electrode and accelerating electrode; after being completed in acceleration, ion beams pass through an electric quadrupole field, and are focused to be in a required small size in a direction Z, and meanwhile, are defocused and spread to a certain length in a direction Y, so as to form a fan-shaped ion beam. The fan-shaped ion beam bombards a moving target; in the direction Y, an emergent neutron beam equivalent to a small-size focal-spot-shaped neutron source is generated. The neutron source which is provided by the invention is suitably applied to the fields, which have requirements on the directivity and the point source characteristic of a neutron beam, of neutron therapy, photography, explosives detection and the like.
Owner:INST OF NUCLEAR PHYSICS & CHEM CHINA ACADEMY OF

Method for forming semiconductor device

The invention provides a method for forming a semiconductor device, comprising the following steps of: providing a substrate, carrying out first ion implantation on the substrate and forming an ion trap; forming a grid structure on the surface of the substrate; taking the grid structure as a mask, carrying out second ion implantation on the substrate and forming lightly-doped regions comprising lightly-doped source regions and lightly-doped drain regions; forming side walls at the two sides of the grid structure, taking the side walls as masks, carrying out third ion implantation on the substrate and forming heavily-doped regions comprising heavily-doped source regions and heavily-doped drain regions, wherein one or more of a first ion implantation environment, a second ion implantation environment and a third ion implantation environment also comprise one or combination of deuterium ions, fluorine ions or chloride ions. According to the method, the deuterium ions, the fluorine ions or the chloride ions are used for saturating silicon dangling bonds at the interface position between the substrate and the grid structure, so as to restrain the hot electron effect.
Owner:SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING) CORP

Hot carrier degradation reduction using ion implantation of silicon nitride layer

A method of reducing hot carrier degradation and a semiconductor structure so formed are disclosed. One embodiment of the method includes depositing a silicon nitride layer over a transistor device, ion implanting a species into the silicon nitride layer to drive hydrogen from the silicon nitride layer, and annealing to diffuse the hydrogen into a channel region of the transistor device. The species may be chosen from, for example: germanium (Ge), arsenic (As), xenon (Xe), nitrogen (N), oxygen (O), carbon (C), boron (B), indium (In), argon (Ar), helium (He), and deuterium (De). The ion implantation modulates atoms in the silicon nitride layer such as hydrogen, nitrogen and hydrogen-nitrogen bonds such that hydrogen can be controllably diffused into the channel region.
Owner:IBM CORP +1

Method for manufacturing optical fiber

A method for manufacturing an optical fiber by contacting the optical fiber during the draw operation with deuterium, a deuterium-containing gas mixture or a deuterium ion plasma. The treatment or coating is performed in a treatment tube that is either separate from or combined with the fiber cooling tube.
Owner:BOC GRP INC

Tamian fusion cell

The Tamian Fusion Cell is a uniquely designed electrolytic cell that promotes the process of nuclear fusion. The cell consists of an outer cylinder whose inner surface is lined with palladium (Pd), a middle cylinder of platinum (Pt), which acts as an ion “kicker”, and a central palladium (Pd) electrode post. The middle (Pt) cylinder is perforated, allowing for the electrolyte and ions to flow from the outer cell chamber through these holes to the inner cell chamber and vice versa. A dual-polarity, direct current power supply is connected to the cell by either a “double-pole double-throw” switch or by an “integrated timing circuit”. The purpose of the I.C. timing circuit or switch is to periodically reverse the polarities of the cell's palladium electrodes, which creates a fluctuating ion flow, whereby promoting constant fusion at the negative palladium electrode. The electrolyte is composed of (LiOD) Lithium deuterium oxide, (H2O) water, heavy water (D2O), (HCl) dilute Hydrochloric Acid, and added (3H+) tritium ions. When an electric current is passed through this electrolytic bath, the positive deuterium ions D+ will accelerate toward the negative (Pd) palladium electrode by the “ion kicker”, causing them to collide and fuse within the palladium metal's crystal lattice structure forming a helium (4He) atom and energy. Water tubes situated within the cell transfer this heat energy to an operational heat exchanger device located outside the cell.
Owner:TAMIAN RICHARD

High current neutron generating device

The invention relates to a device for generating and accelerating deuterium ions through a microwave ion source and generating high current neutrons through deuterium and deuterium (deuterium and tritium) reactions. A solid body with the quite high hydrogen absorbing ability is installed on the upper face of a subcooling target, deuterium is ionized by the microwave ion source and then accelerated to own quite high energy to be shot on the target, the high-energy ions shot on the target react with the deuterium adsorbed on the target, and the neutrons are generated. Compared with a penning ion source scheme commonly adopted at present, the size of the device is increased slightly, while the intensity of deuterium ion beam is increased by several times to dozens of times, the output of the neutrons is multiplied, in addition, the service life of the microwave ion source is long, and thus the service life of the whole device can be several years.
Owner:常州博锐恒电子科技有限公司

Pulsed electrolytic cell

A low energy nuclear reaction power generator provided with an electrolytic cell containing an electrically-conductive heavy or light water electrolyte in which is immersed an electrode pair whose anode is formed of platinum and whose cathode is formed of palladium. Applied across these electrodes is a train of voltage pulse packets, each comprised of a cluster of pulses. The amplitude and duration of each pulse in the packet, the duration of the intervals between pulses, and the duration of the intervals between successive packets in the train are in a predetermined pattern in accordance with superlooping waves in which each wave is modulated by waves of different frequency. Each packet of voltage pulses gives rise to a surge of current in the electrolyte which flows between the electrodes and causes the heavy or light water to decompose, oxygen being released at the platinum electrode while deuterium ions migrate toward the palladium electrode. The successive surges of ions produced by the train of pulse packets bombard the palladium electrode, to bring about dense ion packing which results in fusion and heat.
Owner:ENERGETICS TECH

SOI (Silicon On Insulator) substrate and preparation method thereof

The invention provides a SOI (Silicon On Insulator) substrate and a preparation method thereof. The method comprises steps: a first substrate is provided, and a first dielectric layer is formed on the first substrate; deuterium ion injection is carried out on the first substrate, and a deuterium doping layer is formed in the first substrate with a first predetermined depth; a second substrate is provided, a second dielectric layer is formed on the second substrate, and the first dielectric layer and the second dielectric layer are bonded; thermal annealing is carried out, and microbubbles are formed in the deuterium doping layer; and the first substrate is cut from the deuterium doping layer, and the SOI substrate is formed. deuterium ions exist in the upper-layer silicon of the SOI substrate; when a gate oxide layer or an interface is formed in a subsequent device, deuterium can be diffused and combined with a dangling bond at the interface, and a stable structure can be formed; the deuterium ions can eliminate defects in the device, and penetration of hot carriers can be avoided; hydrogen annealing to eliminate defects is not needed, the device preparation process is simplified, and the performance and the reliability of the device are improved.
Owner:ZING SEMICON CORP

Method for measuring deuterium and tritium depth distribution in solid matter

The invention discloses a method for measuring deuterium and tritium depth distribution in a solid matter. Firstly, deuterium ions are used for bombarding the to-be-tested solid matter, then energy spectrums of protons and alpha particles generated in the bombarding process are measured, and then hydrogen isotope distribution information in the solid matter is obtained through a data processing module capable of self-consistent treatment of hydrogen isotope concentration depth distribution and stopping power. The method for measuring deuterium and tritium depth distribution in the solid matterhas the advantages that depth distribution of the two hydrogen isotopes namely deuterium and tritium in the solid matter can be analyzed simultaneously, and the stopping power is self-consistent in the analyzing results and in the analyzing process.
Owner:HEFEI INSTITUTES OF PHYSICAL SCIENCE - CHINESE ACAD OF SCI

Nondestructive testing system for neutron chemical warfare agent

The invention puts forward a nondestructive testing system for neutron chemical warfare agent. The system comprises a deuterium ion emission device, a deuterium target, a target chamber, a tested sample placement area and [Gamma] ray detectors, wherein the deuterium target is arranged in the target chamber, the deuterium ion emission device is arranged on the outer side of the target chamber, faces the deuterium target and can emit deuterium ions to the deuterium target, the deuterium target is irradiated by the deuterium ions to emit a neutron beam, the tested sample placement area is arranged in a neutron beam emergent direction, the [Gamma] ray detectors are arranged around the tested sample placement area for detecting [Gamma] rays emitted from the sample irradiated by the neutron beam.
Owner:广东太微加速器有限公司

Process system for preparing deuterium-depleted water and method for preparing deuterium-depleted water applied process system

The invention provides a process system for preparing deuterium-depleted water. The process system for preparing the deuterium-depleted water comprises a hydrogen generator, a hydrogen burner and a steam condensing unit which are sequentially connected through a pipeline; and en electrode and an electrolytic cell are arranged in the hydrogen generator, a cathode electrode of the electrode is a platinum electrode, and the platinum electrode is doped with 2-5% phosphorus substances. According to the process system for preparing the deuterium-depleted water, the platinum electrode can keep higherelectrochemical activity in the electrolysis water process, the certain number of phosphorus substances are doped in the platinum electrode to form a Pt-P alloy, a separation coefficient of the platinum electrode for protium and deuterium is obviously improved, cathode electrolysis water provided with the substance is achieved, the electrodeposition rate of deuterium ions in a water solution is much lower than that of protium ions, a large number of deuterium ions are enriched on the cathode, a large number of low-deuterium hydrogen is deposited in the cathode, the obtained low-deuterium hydrogen is burnt, and deuterium content in source water is obviously reduced.
Owner:深圳百奥捷生物科技有限公司 +1

Liquid fuel extraction system and process

The invention provides a liquid fuel extraction system. The liquid fuel extraction system is used for extracting liquid fuel comprising deuterium ions from seawater and comprises an extraction device and a seawater storage tank, wherein the extraction device comprises a reverse osmosis membrane device, seawater is guided out from the seawater storage tank via a pipeline, fresh water in the seawater is filtered out by the reverse osmosis membrane device, and seawater concentrated solution comprising the deuterium ions is used as liquid fuel. The invention further provides an extraction process. By means of reverse osmosis technology, fresh water in the seawater can be separated, and seawater concentrate comprising the deuterium ions is extracted and is reversely utilized, so that a brand-new development direction is provided for the field of development and exploitation of seawater and seawater can be converted into liquid fuel.
Owner:GUANGZHOU TONGHE ENERGY TECH

Method for manufacturing a magneto-resistance effect element and magnetic recording and reproducing apparatus

A method for manufacturing a magneto-resistance effect element is provided. The magneto-resistance effect element includes a first magnetic layer including a ferromagnetic material, a second magnetic layer including a ferromagnetic material and a spacer layer provided between the first magnetic layer and the second magnetic layer, the spacer layer having an insulating layer and a conductive portion penetrating through the insulating layer. The method includes: forming a film to be a base material of the spacer layer; performing a first treatment using a gas including at least one of oxygen molecules, oxygen atoms, oxygen ions, oxygen plasma and oxygen radicals on the film; and performing a second treatment using a gas including at least one of hydrogen molecules, hydrogen atoms, hydrogen ions, hydrogen plasma, hydrogen radicals, deuterium molecules, deuterium atoms, deuterium ions, deuterium plasma and deuterium radicals on the film submitted to the first treatment.
Owner:KK TOSHIBA +1

Electromagnetic Element Reactor

InactiveUS20150010123A1Minimizes electromagnetic repulsive forceMaximizes electromagnetic attractive forceNuclear energy generationLow temperature fusion reactorHeliumDeuterium ions
A method and device for production of helium and recoverable energy is provided. The system directs a first directionalized flow of a of a first streaming population of deuterium ions to an intersection with a second directionalized flow of a second streaming population of deuterium ions opposite the first stream. At or proximate to an intersection of the two streams helium and waste energy are produced and captured.
Owner:BURDICK CHARLES

Magnetic-confinement annular return pipe and straight fusion pipe

The invention belongs to the technical field of magnetic-confinement nuclear fusion. Magnetic-confinement nuclear fusion mainly comprises two kinds: one is an international thermonuclear fusion experiment reactor, wherein plasmas are sealed in an annular pipe with a radial gradient in a magnetic field, and ions easily run to a pipe wall; and the other is that plasmas are sealed in a straight fusion pipe with axisymmetric magnetic field distribution, ions cannot run to a pipe wall, and a magnetic plug is adopted, so difficult-to-block ions overflow from two ends. The magnetic plug has to be studied for many years before application. Therefore, the invention provides a magnetic confinement annular return pipe and a straight deuterium tritium (DT) fusion pipe as designed in an attached drawing of the specification. The magnetic confinement annular return pipe and the straight deuterium tritium fusion pipe consist of a straight fusion pipe 10 positioned in a superconducting coil 17, and annular return pipes 7 and 20 with two ends positioned in superconducting coils 5 and 18. Deuterium ions, tritium ions and electrons are respectively injected into the left and right ends. Under the constraint of a magnetic field, ions and electrons flow out from the two ends of the fusion pipe, pass through the annular return pipe and then flow into the fusion pipe again. In the straight fusion pipe, ions with opposite movement directions collide with each other, and hundreds of thousands of watts of deuterium-tritium fusion power is generated per cubic centimeter. The magnetic confinement annular return pipe and the straight deuterium tritium fusion pipe can be applied in several years.
Owner:李又平

Method for achieving growth of monocrystalline silicon through Czochralski method

The invention provides a method for achieving the growth of monocrystalline silicon through a Czochralski method. The method comprises the steps of: step (1), providing silicon wafers doped with deuterium, nitrogen and barium ions and a polycrystalline silicon raw material, putting the silicon wafers and the polycrystalline silicon raw material in a crucible for fusion; and step (2), forming the monocrystalline silicon ingot doped with the deuterium and nitrogen ions by using the Czochralski method through the addition of a magnetic field. According to the method for achieving the growth of the monocrystalline silicon through the Czochralski method, the level of impurities in a molten mass and the grown monocrystalline silicon crystal ingot can be reduced, and by performing high-temperature annealing on the nitrogen-doped monocrystalline silicon wafers, COP defects in the surface area of the silicon wafers can be eliminated; by storing the deuterium ions in gaps of the monocrystallinesilicon ingot, the content of impurities of oxygen and carbon can be reduced, and when a device is formed on wafers which grow later, the deuterium ions can combine with vacant bonds at an interface between a gate dielectric layer and a semiconductor to form a stable structure, so that penetration of hot carriers can be avoided; besides, the leakage current is reduced, and the performance and reliability of the device are improved; by doping the silicon wafers with the nitrogen, deuterium and barium ions, the application amount of the doped silicon wafers can be reduced, and the manufacture cost can be reduced.
Owner:ZING SEMICON CORP

Fusion Reactor

A fusion reactor includes a columnating panel disposed between the positive electrode and negative electrode for channeling deuterium ions along predetermined paths that are likely to lead to fusion-producing collisions with previous deuterium ions. Deuterium ions are introduced to the reactor adjacent to the positive electrode, and then pass from the columnating panel, through a reduced pressure chamber, and then proceed towards the negative electrode. Once the deuterium ions strike the negative electrode, they remain attached to the negative electrode so that subsequent deuterium ions following the same channels through the columnating panel are more likely to collide with them.
Owner:SPECTRE ENTERPRISES

Multiposition Target Plane for Variable Source-Detector Distance Using DD, DT Sealed Neutron Source

Method and apparatus for evaluating an earth formation using at least one detector with a pulsed neutron source that includes a beam of deuterium ions that can be directed to a selected position on a target including tritium that extends axially along a sealed tube. This makes it possible to generate pulsed neutrons from a plurality of positions.
Owner:BAKER HUGHES INC

Small High Yield Deuterium Deuterium Neutron Generator

The invention discloses a small high-yield and deuterium-deuterium neutron generator. Modular distributed high-frequency ion sources are adopted and evenly distributed on the outer surface of a ceramic cylinder with the spherical end, and deuterium ion beams distributed evenly are output, wherein the flow intensity of the deuterium ion beams is larger than 1 A, and the single atom proportion is larger than 80%; the deuterium ion beams are accelerated in a cylindrical accelerating electric field with the spherical end and bombard a cylindrical metal or ceramic self-forming target to cause a deuterium / deuterium reaction and then generate neutrons of 2.45 MeV, and the self-forming target is located at the high-potential end and provided with the spherical end. The number of the modular distributed high-frequency ion sources and the area of the self-forming target are not limited, the yield of the neutrons of the deuterium / deuterium reaction is larger than 1011 n / s, and no radioactive pollutants are discharged. The neutron generator is suitable for commercialized application such as the fields of boron neutron capture treatment, neutron radiography, on-line material component neutron detection, neutron irradiation modification and californium neutron source substitute products.
Owner:INST OF NUCLEAR PHYSICS & CHEM CHINA ACADEMY OF
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