The invention discloses a preparation method for a
deuterium-containing
metal film target. The preparation method comprises the following steps: firstly, using high-purity
molybdenum or high-purity
copper as a substrate material of the
deuterium-containing
metal film target, and performing surface pretreatment on the substrate material; secondly, mounting and placing the substrate into a
physical vapor deposition (PVD)
vacuum coating machine, bombarding the surface of the substrate with
argon ions, removing an
oxide layer on the surface of the substrate by
sputtering; thirdly, setting the
coating temperature of the substrate, introducing high-purity
deuterium gas in a vacuum cavity, starting the
coating machine, and directly preparing the deuterium-containing
metal film; fourthly, turning off the
coating machine, continually introducing deuterium gas into the vacuum cavity, and turning off a deuterium gas flower meter until an appropriate air pressure is reached in the cavity. By adopting the preparation method, the mechanical performance of the deuterium-containing metal film target is improved, the
brittleness and occurrence of cracks are controlled effectively, and
adhesive force of the target film is enhanced; meanwhile, the thickness of a
dead layer on the surface is decreased, the purity of the target film is increased, the
neutron yield of a
neutron generator is increased, and the service life of the target is prolonged.