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Preparation method of microchannel heat sink for high-heat flux heat dissipation

A high heat flux density, micro-channel technology, applied in semiconductor/solid state device manufacturing, electrical components, electrical solid state devices, etc., can solve problems such as difficulty in meeting high heat flux density heat dissipation requirements, chip thermoelectric mismatch, and circuit power rise. , to achieve the effect of good weldability and stability, good mechanical support, and large cross-sectional area

Inactive Publication Date: 2017-04-19
NO 55 INST CHINA ELECTRONIC SCI & TECHNOLOGYGROUP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] With the rapid development of highly integrated electronic devices, micro-electro-mechanical systems, and high-power lasers, the power of the circuit has increased significantly, and the heat flux generated during the working process has inevitably increased sharply, KW / m 2 , MW / m 2 The heat dissipation problem of magnitude high heat flux has attracted widespread attention, which requires the heat sink to take away a large amount of heat from the limited contact area with the chip. Traditional heat sink materials, such as LTCC, A1 2 0 3 , BeO, AlN, Al, Cu, Mo, W, steel, Kovar alloy, Cu / W and Cu / Mo, etc. are difficult to meet the heat dissipation needs of this high heat flux
The active microchannel heat sink based on microsystem technology and fluid mechanics theory takes the heat generated by the device or system away from the heat sink in time through high thermal conductivity media, such as water and liquid nitrogen, so that the temperature on the surface of the heat sink can be kept as high as possible. It may be reduced and kept constant, and has the advantages of small volume, large heat dissipation area, batch production, and low cost. However, traditional microfluidic channels are mainly used on oriented silicon wafers or on substrates using micromachining and anisotropic etching. Technology production, the cross-section of the micro-channel is small, and the liquid single-phase flow through the micro-channel will be accompanied by a large temperature rise, causing serious problems such as excessive thermal stress or chip thermoelectric mismatch

Method used

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Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0015] A method for preparing a microfluidic heat sink for heat dissipation with high heat flux, comprising the following steps:

[0016] a) Material selection, select a plate with a thermal conductivity of 1.0 to 300W / m.k, and a linear expansion coefficient (TEC) that matches the linear expansion coefficient of silicon, gallium arsenide, silicon nitride, and gallium nitride;

[0017] b) Make micro-channels inside the plate, and process micro-channels with a width of 0.3-1.0mm on the plate by combined processing methods such as etching, laser cutting and mechanical stamping;

[0018] c) The three-dimensional micro-channel is formed without deformation, and the plates with the internal channel structure are combined by filling the filling material into the channel and laminated by hot pressing, and the micro-channel heat sink is formed through subsequent processing;

[0019] d) Integrate the metal frame, ceramic frame, outer leads, IC devices, sensors, and heaters on the active...

Embodiment 1

[0028] The present invention relates to very suitable for preparing thermal expansion coefficient in (4.5~7)X10 -6 / K, the power density is 10~5000w / cm 2 Heat dissipation requires an active microfluidic heat sink, the steps of which include:

[0029] a) The method of laser cutting or mechanical punching has a thickness of 0.1-2.0mm, has a stable dielectric constant, excellent mechanical strength and high temperature stability, and is compatible with silicon, gallium arsenide, silicon nitride, gallium nitride, etc. Through-holes with a diameter of 0.1-0.5 mm and micro-channels with a width of 0.3-1.0 mm are processed on green ceramics with very close thermal expansion coefficients;

[0030] b) Inject the conductor metallization paste into the through hole processed in step a through the mask plate with a thickness of 0.1-0.5 mm; fill the heterogeneous material into the micro-channel;

[0031] c) Use a precision wire mesh with a wire diameter of 12-35um and a thick film patter...

Embodiment 2

[0036] The present invention is very suitable for the preparation of thermal expansion coefficient in (5 ~ 17.6) * 10 -6 / K, the power density is 10~5000w / cm 2 Heat dissipation requires an active microfluidic heat sink, the steps of which include:

[0037] a) The method of etching, mechanical stamping or milling has a thickness of 0.1-2.0mm, has excellent mechanical properties and high temperature stability, and has a thermal expansion coefficient of (5-17.6) ×10 -6 Process microchannels with a width of 0.3-1.0mm on plates such as Al, Cu, Kovar, Cu / W and Cu / M between / K;

[0038] b) stacking the plates that have passed through step a, and forming a heat sink containing micro-channels by welding or hot pressing.

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PUM

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Abstract

The invention relates to a preparation method of a microchannel heat sink for high-heat flux heat dissipation. The method includes the following steps that: a) materials are selected; b) a microchannel is made inside a plate; c) three-dimensional microchannel deformation-free modeling is performed; d ) and a metal frame, a ceramic frame, an outer lead, an IC device, a sensor and a heater are integrated on an active microchannel heat sink, so that system miniaturization can be realized, mechanical support and environmental protection are provided for a chip and an internal circuit, and an input and output function is realized for the chip and the internal circuit. The thermal expansion coefficient of the product is adjustable; and heat generated by devices or a system can be taken away from the heat sink through a high-thermal conductivity medium, the temperature of the surface of the heat sink can be decreased as much as possible and remain constant. The microchannel heat sink has the advantages of small size, large heat dissipation area, good solderability and high stability, and can meet the requirement of high-power density heat dissipation, and can be in sealed connection with other components or parts.

Description

technical field [0001] The invention relates to a method for preparing a microchannel heat sink for heat dissipation with high heat flux, and belongs to the technical field of microelectronic manufacturing. Background technique [0002] With the rapid development of highly integrated electronic devices, micro-electro-mechanical systems, and high-power lasers, the power of the circuit has increased significantly, and the heat flux generated during the working process has inevitably increased sharply, KW / m 2 , MW / m 2 The heat dissipation problem of magnitude high heat flux has attracted widespread attention, which requires the heat sink to take away a large amount of heat from the limited contact area with the chip. Traditional heat sink materials, such as LTCC, A1 2 0 3 , BeO, AlN, Al, Cu, Mo, W, steel, Kovar, Cu / W and Cu / Mo, etc. are difficult to meet the heat dissipation needs of this high heat flux. The active microchannel heat sink based on microsystem technology and f...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/48H01L23/36
CPCH01L21/4871H01L21/4878H01L23/36
Inventor 唐利锋
Owner NO 55 INST CHINA ELECTRONIC SCI & TECHNOLOGYGROUP CO LTD
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