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Method for treating indium tin oxide etching waste liquor

A technology for etching waste liquid and tin indium oxide, which is applied in chemical instruments and methods, energy wastewater treatment, water/sewage treatment, etc., can solve the problems of high price of rare metal indium, waste of waste liquid acid resources, and low stock, etc.

Inactive Publication Date: 2017-05-17
BOE TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] At present, for the ITO etching waste liquid, alkali such as calcium hydroxide or calcium carbonate is mainly used for neutralization treatment, but this method not only wastes the acid resources in the waste liquid, but also produces a large amount of waste water, which further causes environmental burden; at the same time Indium, which is used as a raw material for ITO target materials, cannot be recycled. The rare metal indium is not only expensive but also has a small stock. According to statistics, the global indium reserves are only 50,000 tons, and only 50% of them can be mined. More than 1700 tons

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0071] In the distillation device, put 1000ml (1080g) of tin indium oxide etching waste liquid into it, which contains: 313.2g of hydrochloric acid, 86.4g of acetic acid, 4.32g of tin ions, and 1.62g of indium ions at 1 standard atmospheric pressure Distillation time under the pressure and 100 ℃ of temperature, obtain 825ml distillate and 175ml after distillation. The distillate contains: 4.32g of tin ions, 1.62g of indium ions, and the distilled liquid contains: 18.5g of hydrochloric acid, 12.32g of acetic acid and 138.2g of water, and its pH is 2.02. Hydrochloric acid was added until pH=0.1.

[0072] In the precipitation device, 175 ml of distillate was charged. Hydrogen sulfide gas was passed through at a rate of 10ml / S for 40 minutes to form a precipitate. Filter with a vacuum filter funnel, and wash the precipitate with water to obtain 5.46 g of tin sulfide precipitate. The filtrate contained 1.62 g of indium ions.

[0073] In the electrolytic cell, 170 ml of filtrate...

Embodiment 2

[0076] In the distillation device, put 1000ml (1080g) of tin indium oxide etching waste liquid into it, which contains: 313.2g of hydrochloric acid, 86.4g of acetic acid, 4.32g of tin ions, and 1.62g of indium ions at 1 standard atmospheric pressure Distillation time under the pressure and 100 ℃ of temperature, obtain 825ml distillate and 175ml after distillation. The distillate contains: 4.32g of tin ions, 1.62g of indium ions, and the distilled liquid contains: 18.5g of hydrochloric acid, 12.32g of acetic acid and 138.2g of water, and its pH is 2.02. Hydrochloric acid was added until pH=1.

[0077] In the precipitation device, 175 ml of distillate was charged. Hydrogen sulfide gas was passed through at a rate of 10ml / S for 40 minutes to form a precipitate. Filter with a vacuum filter funnel, and wash the precipitate with water to obtain 3.84 g of tin sulfide precipitate. Because only 60% of the tin is removed, the tin removal effect is average, which will lead to relative...

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Abstract

The invention provides a method for treating indium tin oxide etching waste liquor. The indium tin oxide etching waste liquor contains hydrochloric acid, acetic acid, tin ions, indium ions and water. The method comprises the following steps that the etching waste liquor is distilled, and distillate containing hydrochloric acid and acetic acid and distilled liquid containing the tin ions and indium ions are obtained; the tin ions and sulfur ions in the distilled liquid react to generate sediment, the tin ions are removed from the solution, and a sediment solution containing the indium ions is obtained; and the sediment solution is subjected to electrolysis to obtain rough indium. By means of the method, valuable substances such as hydrochloric acid, acetic acid and indium in the waste liquor can be recycled and reused.

Description

technical field [0001] The disclosure relates to a comprehensive utilization method for treating waste etching liquid, in particular to a method for treating waste etching liquid for indium tin oxide semiconductor transparent conductive film (ITO). Background technique [0002] Indium tin oxide semiconductor transparent conductive film (ITO) is mainly used in thin film field effect transistor liquid crystal display (TFT-LCD), light emitting diode (LED), organic light emitting diode (OLED), etc. Etching the ITO to obtain the desired pattern. [0003] The ITO etching solution includes an aqueous solution of hydrochloric acid and acetic acid, and the etching process will produce a large amount of etching waste solution, which is acidic and contains significant amounts of hydrochloric acid and acetic acid. [0004] At present, for the ITO etching waste liquid, alkali such as calcium hydroxide or calcium carbonate is mainly used for neutralization treatment, but this method not ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C25C1/22C01B7/07C07C51/44C07C53/08
CPCC01B7/0712C07C51/44C25C1/22C07C53/08C02F1/048C02F1/4678C02F1/5236C02F1/66C02F9/00C02F2103/346C25F3/08Y02W10/37C02F1/461
Inventor 谢勇贤邓传峰李佑路贺之洋
Owner BOE TECH GRP CO LTD
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